Vacuum plasma cleaner

Vacuum plasma cleaner action principle: 1.Etching on the surface of the material - physical effect A large number of active particles in the plasma, such as a large number of ions, excited molecules, and free radicals, act on the surface of the solid sample, which not only removes the original contaminants and impurities, but also produces an etching effect to roughen the surface of the sample and form many fine pits, which increases the specific surface of the sample,improves the wetting properties of solid surfaces. 2.Activation bond energy, cross-linking The energy of the particles in the plasma is between 0 and 20 eV, and most of the bond energy in the polymer are between 0 and 10 eV. Therefore, after the plasma acts on the solid surface, the original chemical bond on the solid surface can be broken. Free radicals in the plasma form a network of crosslinked structures with these bonds, greatly activating surface activity. 3.Formation of new functional groups - chemical action If a reactive gas is introduced into the electric discharge gas, a complicated chemical reaction occurs on the surface of the activated material, and new functional groups such as hydrocarbonyl, amidogen, carboxyl group, and the like are introduced, and these functional groups are all active groups, which can significantly improve the surface activity of the material. Vacuum plasma cleaner advantages: (1) low processing temperature The processing temperature can be as low as 80℃ and below 50 ℃. Low processing temperatures ensure no thermal effects on the sample surface. (2) no pollution during the whole process The plasma cleaner itself is a very environmentally friendly device that does not cause any pollution and does not cause any pollution during the treatment process. (3) stable treatment effect The treatment effect of plasma cleaning is very uniform and stable, and the conventional sample maintains good effect for a long time after treatment. (4) It can handle samples of various shapes For complex figurate samples, plasma cleaning can find the right solution.Vacuum plasma cleaning can clean the internal position of the solid sample. The vacuum plasma cleaner is equipped with a comprehensive set of technical specifications and system standard accessories. The equipment itself measures 1105mm in width, 1488mm in depth, and 1842mm in height (2158mm with the signal light height included). It features an 8-layer horizontal plate and a battery lead plate with dimensions of 402mm in width and 450mm in depth. For precise gas control, the cleaner is equipped with a gas flow controller supporting 2-circuit process gases and a range of 0-300ml/min. Accurate vacuum measurement is facilitated by the use of a Japanese ulvac vacuum gauge, ensuring reliable operation. The human-machine interface touch screen is an SD independent research and development component, enhancing user interaction with the system. The electrode spacing is set at 48mm, and a signal indicator with three ribbon alerts provides crucial feedback. The vacuum pump is a 90m3/h bipolar oil pump, contributing to efficient vacuum processes. The system's power supply requirements include AC380V at 50/60Hz, with a rated power of 5000W. The total system weight, comprising the device host and vacuum pump, is less than 600Kg. The equipment host itself measures 1805mm in width, 1988mm in depth, and 1842mm in height. The RF power supply operates at a frequency of 13.56MHz, delivering 1000W of power. It is equipped with a fully automatic matching system that incorporates leading air capacitance technology to optimize performance. In terms of necessary conditions, the system requires AC380V at 50/60Hz, three-phase five-wire power supply with a capacity of 7.5KVA.