Vacuum heating type spin coater
The vacuum heating-type spin coater operates on the centrifugal coating principle, effectively applying liquid or colloidal materials onto substrates such as silicon wafers, crystals, quartz, ceramics, and more to create thin films. These thin films find extensive applications in the realm of material research. The work chamber of the heating-type spin coater is constructed from polytetrafluoroethylene (commonly known as PTFE or plastic king). PTFE is a polymer compound resulting from the polymerization of tetrafluoroethylene, renowned for its exceptional chemical stability and robust resistance to corrosion. This makes it an ideal choice for various applications where resistance to acids, alkalis, and organic solvents is essential.
Product Description
The vacuum heating-type spin coater offers a range of impressive features tailored for precise and controlled thin-film preparation. Its standout attribute is its ability to maintain a constant temperature on the coated surface, with a temperature control precision of 0.1°C, allowing for the uniform coating of organic materials. This versatile device supports sequential coating and baking processes to suit various applications, and it can store different rotational speed parameters for distinct substrate types. Furthermore, its sturdy construction employs polypropylene (PP) material in the work chamber, known for its durability and resistance, ensuring reliable and consistent performance in demanding research environments.
The vacuum heating-type spin coater boasts impressive technical specifications. It offers a broad range of rotating speeds from 0 to 10,000 rpm, with a finely adjustable speed resolution of 1 rpm. Its accelerated speed can vary between 100 and 5,000 rpm/s, providing precise control over the coating process. Additionally, it supports extended single step times of up to 3,000 seconds, making it suitable for various coating applications. Operating on AC 220V and 50Hz, this spin coater is equipped to handle demanding tasks in materials research and thin-film preparation.
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