Two Zones Css Furnace for Rapid Thermal Processing Upto 5" Dia Wafer at Max. 800c

The OTF-1200X-RTP-II-5 is a versatile desktop heating system designed for laboratory and research applications. This heating system carries CE and TUV certifications, ensuring its quality and reliability. It operates as a heating type device and is equipped with a digital temperature controller, making it suitable for precise temperature control in various experiments. The thermocouple used in this system is of the K type, known for its accuracy and reliability. The vacuum flange is constructed from stainless steel, ensuring durability and resistance to corrosion. This heating system has a working temperature of up to 800°C, making it suitable for a wide range of research and laboratory tasks. It is a customized solution that is versatile and designed to meet specific experimental needs. The system is packaged in a wooden box to ensure safe transport and handling. It is an excellent choice for academic institutions and research facilities seeking a dependable heating system for their experiments and studies.

The precision in temperature control is a highlight of this furnace, featuring two 30-segment temperature controllers built-in, ensuring an accuracy level of +/-1ºC. The addition of an RS485 port and control software facilitates easy operation and temperature profile logging via a computer, offering a convenient solution for researchers engaged in the development of next-generation thin films for solar cell applications, including materials like CdTe, Sulfide, and Perovskite solar cells.

The OTF-1200X-RTP-II-5 not only provides researchers with a valuable tool for their thin film research endeavors but also emphasizes reliability and efficiency in its design. This furnace offers the capacity and control required to achieve precise and consistent results, making it an indispensable asset for those working on cutting-edge thin film coating processes.

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