Three targets magnetron sputtering coater (with DC&RF power supply) MSP300S-2DC1RF
Three targets magnetron sputtering coater is a special laboratory coating machine developed by our company. The equipment can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
Product Description
Our Magnetron sputtering coater equipment stands out as a specialized laboratory coating machine meticulously crafted by our company. This cutting-edge equipment offers the flexibility of being equipped with both DC and RF power supplies, ranging from 500W to 1000W, catering to diverse coating needs. Its applications span the preparation of single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, and more. Distinguishing itself from conventional plasma sputtering methods, magnetron sputtering brings forth advantages such as heightened energy, accelerated deposition rates, and minimal temperature elevation in samples.
The innovation continues with the incorporation of a water-cooled interlayer in the magnetron target, efficiently dissipating heat and preventing any accumulation on the target surface, ensuring stable and prolonged operation. A harmonious blend of compact design, aesthetic appeal, and comprehensive functionality is achieved, providing an ideal solution for thin film preparation in laboratory settings. The user-friendly touch screen interface and built-in one-button coating program further enhance the operational ease of the entire machine.
Taking precision to the next level, our three-target magnetron sputtering coater is endowed with specific technical parameters, guaranteeing its efficiency. Operating on AC220V, 50Hz power supply with a robust 6KW capacity, the coater attains an impressive ultimate vacuum level of 5x10-4Pa, signaling its competence in delivering high-quality coatings. The φ150mm sample table offers generous space, enduring a maximum heating temperature of 500℃ with ±1℃ temperature control accuracy. Additionally, the coater provides adjustable rotation speeds from 1 to 20rpm, accommodating a spectrum of coating requirements effectively.
The magnetron sputtering heads, featuring three 2-inch heads, are efficiently cooled by a water-cooling system requiring a flow rate of 10L/min, ensuring consistent and reliable sputtering performance. A dedicated water chiller further supports the cooling process, optimizing heat dissipation. The φ300mm diameter vacuum chamber, constructed from high-quality SUS material, ensures durability and corrosion resistance. Equipped with a φ100mm watch window and an open-type design, the chamber simplifies the replacement of targets, enhancing operational convenience.
Gas environment control is precise with a one-channel gas flow controller, offering a 200sccm capacity for argon (Ar) gas. The vacuum pump system relies on a molecular pump with a high pumping speed of 600L/S, vital for maintaining the desired vacuum conditions. For film thickness monitoring, the coater incorporates a quartz vibrating film thickness gauge with a resolution of 0.10 angstrom. The sputter power source includes two 500W DC power supplies for metal films and one 500W RF power supply for non-metallic films. The coater's operation is seamlessly conducted through an all-in-one computer interface, offering user-friendly control and monitoring. With dimensions of 1090mm x 900mm x 1250mm and a weight of 350kg, the coater stands as a versatile and reliable tool, ready to meet the demands of advanced coating applications in various laboratory or industrial settings.
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