Three targets magnetron sputtering coater (500W DC&500W RF)

Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory. The Three heads magnetron sputtering coater is equipped with comprehensive technical parameters to ensure efficient and precise operation. It operates on AC220V at 50Hz and consumes a total power of 6KW. Achieving an ultimate vacuum of 5x10-4Pa, it offers a highly controlled environment for sputtering processes. The sample table features a φ150mm size and offers impressive heating capabilities with a maximum temperature of 500℃, ensuring precise temperature control within ±1℃. The table is designed for versatility with adjustable rotation speeds ranging from 1 to 20rpm. The magnetron sputtering head is equipped with two 2-inch targets, employing an efficient water-cooling system that requires a flow rate of 10L/min. A dedicated water chiller ensures effective circulating water cooling. Within the vacuum chamber, measuring φ300mm in diameter and 340mm in height and constructed from SUS material, the coater maintains a pristine sputtering environment. A φ100mm watch window provides observation capabilities, and the open-type design facilitates easy target replacement. Gas flow control is achieved with a one-channel controller for Ar gas at 200sccm. The vacuum pump system utilizes a molecular pump with a pumping capacity of 600L/S, ensuring efficient evacuation. Film thickness measurements are conducted using a quartz vibrating film thickness gauge, offering impressive resolution at 0.10 angstroms. The sputter power source includes two DC power supplies, each with a 500W capacity, suitable for preparing metal films, and one 500W RF power supply, suitable for non-metallic film deposition. Operation and control are facilitated through an all-in-one computer interface. In terms of size, the coater has overall dimensions measuring 1090mm x 900mm x 1250mm, with a total weight of 350kg. These detailed technical specifications collectively define the capabilities and dimensions of the Three heads magnetron sputtering coater, providing a clear insight into its features and performance.