Three targets DC magnetron sputtering coater MSP300S-3DC

Presenting our state-of-the-art Three-target DC magnetron sputtering coater, meticulously designed as a specialized laboratory coating machine by our company. This versatile equipment offers compatibility with both DC power supply and RF power supply, ranging from 500W to 1000W, making it an ideal choice for preparing single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, and more. In comparison to conventional plasma sputtering methods, magnetron sputtering boasts superior advantages, including high energy, rapid deposition rates, and minimal sample temperature elevation. The magnetron target is ingeniously designed with a water-cooled interlayer, effectively dissipating heat and preventing heat accumulation on the target surface, ensuring stable and prolonged operation.
 

This coater, with its compact design harmonizing volume and performance, stands out with an aesthetically pleasing appearance and comprehensive functionality. The entire operation is seamlessly controlled through an intuitive touch screen interface and a built-in one-button coating program, simplifying user interaction and establishing itself as an ideal laboratory equipment for thin film preparation.
 

The technical excellence of the Three-target DC magnetron sputtering coater is evident in its precise specifications, ensuring efficient performance. Operating on an AC220V, 50Hz power supply with a robust 6KW capacity, the coater achieves an impressive ultimate vacuum level of 5x10-4Pa, indicating its capability for high-quality coatings. The sample table, boasting a φ150mm size, accommodates various samples and sustains a maximum heating temperature of 500℃ with precise temperature control accuracy of ±1℃. Adjustable rotation speeds from 1 to 20rpm add versatility to coating processes.
 

The coater features three 2-inch magnetron sputtering heads, efficiently cooled by a water-cooling system, maintaining consistent and reliable sputtering performance. A dedicated water chiller further supports the cooling process, ensuring optimal heat dissipation. The φ300mm diameter vacuum chamber, constructed from high-quality SUS material, offers durability and corrosion resistance. It incorporates a φ100mm watch window, facilitating observation, and adopts an open-type design for easy target replacement, enhancing operational convenience.
 

For precise gas environment control, the coater integrates a one-channel gas flow controller with a 200sccm capacity for argon (Ar) gas. The vacuum pump system relies on a molecular pump with a high pumping speed of 600L/S, essential for maintaining the desired vacuum conditions throughout the coating process. A quartz vibrating film thickness gauge provides accurate measurements with a 0.10 angstrom resolution, ensuring precise monitoring of film thickness during coating. The DC power supply, rated at 500W, is suitable for preparing metal films. The all-in-one computer interface facilitates user-friendly control and monitoring. With overall dimensions of 1090mm x 900mm x 1250mm and a weight of 350kg, this coater is a versatile and reliable tool for advanced coating applications in various laboratory or industrial settings.

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