Three target upper magnetron sputtering coating
Three target magnetron sputtering coating instrument is a cost-effective magnetron sputtering coating equipment independently developed by our company, which has the characteristics of standardization, modularization and customization. The equipment can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc
Product Description
Introducing our highly efficient three-target magnetron sputtering coating instrument, a product of our company's independent development, boasting standardization, modularization, and customization features. This versatile equipment is designed for the preparation of various films, including single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, and polytetrafluoroethylene films. With the flexibility to use DC power supply for metal film preparation and RF power supply for non-metallic films, the three-target configuration caters to the demands of multi-layer or multiple coatings.
This advanced coating instrument stands out for its widespread applicability, compact design, and user-friendly operation, making it an ideal choice for material film preparation in laboratory settings. The sample table features a top-center setting with a shutter, capable of accommodating samples with a diameter of φ150mm. Precision control is ensured with a heating range from room temperature to 500℃ and an adjustable speed of 1-20rpm. Notably, the distance between the target and substrate is electrically adjustable, enabling precise targeting. The three circular plane targets in the magnetron target gun operate within a sputtering vacuum range from 10Pa to 0.2Pa, providing flexibility for various applications. The vacuum chamber is meticulously designed with inner wall electrolytic polishing and constructed from 304 stainless steel, ensuring durability and cleanliness. A quartz observation window with a diameter of φ100mm and a shutter facilitates precise monitoring. The gas control system, featuring a 3-way mass flow meter, enables accurate flow control of oxygen, argon gas, and nitrogen, supporting a variety of inert gases.
Operating within a working pressure range of 0.3MPa, the robust valve body can withstand pressures up to 3MPa. The power supply system includes a DC power supply delivering 500W with an output voltage range of 0-600V and a timing length of 65000S. Additionally, the RF power supply, with a power output of 500W, operates at a stable frequency of 13.56MHz, ensuring stable performance with minimal reflected power. The entire system is designed for seamless communication with an RS485 MODBUS protocol interface.
In summary, the three-target magnetron sputtering coating instrument combines versatility, precision, and efficiency, making it a valuable asset for diverse coating applications in laboratory environments.
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