Three sputter sources magnetron sputtering coater with UPS

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory. The Three-target magnetron sputtering coater is equipped with a comprehensive set of technical parameters to ensure efficient and precise operation. The supply voltage is VAC 220 at 60Hz, and it is backed up by a UPS with a capacity of 20KVA and 16KW, providing a 1-hour delay with 16 batteries having a capacity of 38AH. The vacuum chamber, constructed from 304 stainless steel, measures Dia. 325mm in diameter and has a height of 385mm. It features a ~4'' (100mm) viewport with a shutter for observation and access. The sample stage is equipped with a top sample holder and a sample table with a diameter of Dia. 150mm. It can accommodate samples with a maximum diameter of 4''. The stage offers adjustable rotation speeds ranging from 0 to 40rpm and heating capabilities up to 700℃. A water chiller with a water flow rate of 2.3m3/h and 3-phase power is integrated into the system. It boasts a cooling capacity of 8250Kcal/h and a compressor output power of 2.25KW. The magnetron sputtering component includes three 2'' magnetron sputter guns with automatic shutters. The sputtering orientation is upwards, and the target diameter is 2''. Rare earth magnets are employed for efficient sputtering. For RF power generation, there are three RF 300W power supplies with auto match capabilities. The power output range is from 5W to 300W, with a maximum reflected power of 100W. Power stability is maintained at ±0.1%, and harmonic components are limited to ≤-50dbc. The power supply operates on single-phase 187-253 VAC, 50/60Hz, with an efficiency of ≥70% and a power factor of ≥90%. Reflected power (at maximum power) is <3W. The maximum load current is 30ARMS, and the maximum load voltage is 7500VRMS. Cooling is achieved through forced cooling. The system is equipped with three MFC mass flow controllers for Ar, O2, and N2, with measuring ranges up to 20sccm. Each is equipped with pneumatic isolation valves and filters. Control is fully automatic through PC or PLC, with the capability to store a minimum of 100 recipes. The system is operated through a 19'' flat controller for ease of use and efficient control of the sputtering process.