Tantalum(V) ethoxide / 10 G
Safety Information
Hazard Statements
Precautionary Statements
Pictograms

Properties
Signal Word | Warning |
Flash Point (C) | 29 °C - closed cup |
Flash Point (F) | 84.2 °F - closed cup |
Density | 1.566 g/mL at 25 °C (lit.) |
Boiling Point | 155 °C/0.01 mmHg (lit.) |
Melting Point | 21 °C (lit.) |
Product Description
Tantalum(V) ethoxide is a chemical compound widely used as a precursor in the synthesis of tantalum-containing materials. Its application is crucial in the production of thin films, coatings, and electronic components.
Application:
Applied as a precursor, Tantalum(V) ethoxide is instrumental in the synthesis of tantalum-based materials, specifically in the manufacturing of thin films, coatings, and electronic components.
Articles:
- Chemical Vapor Deposition of Tantalum Oxide from Tetraethoxo(β-diketonato)tantalum(V) Complexes
Publication Date: March 31, 1999
Kimberly D. Pollard and Richard J. Puddephatt
https://doi.org/10.1021/cm981047a
- Strong π-interactions between tantalum and apical ligands in square pyramidal complexes supported by a rigid tetradentate spectator ligand
Publication Date: Available online 16 June 2015
Richard S. Morris, Gino G. Lavoie
https://doi.org/10.1016/j.ica.2015.06.005
- Preparation of oriented lithium tantalate thin films using molecularly modified tantalum(V) ethoxide and lithium acetate
Publication Date: January 1992
T. A. Deis & P. P. Phule