Small plasma sputtering coater with rotary heating stage & water chiller PSP180G-1TA-RSH
This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage.
Product Description
This compact plasma sputtering coater, featuring a PLC control system and user-friendly touch screen operation, offers a seamless and easily navigable experience for laboratory coating experiments. The equipment is not only visually appealing due to its small size and aesthetic design but also stands out for its functionality, particularly with the inclusion of a rotatable heating sample stage. This innovative feature enhances coating uniformity and film adhesion, further solidifying its status as an optimal choice for thin-film deposition applications.
Designed with meticulous technical specifications, this small plasma sputtering instrument accommodates diverse samples on its 100mm-sized sample stage, with adjustable rotating speeds ranging from 1 to 20rpm. The heating system, with a maximum temperature capability of ≤500℃, ensures precise temperature control through PID temperature control with an accuracy of ±1℃. Equipped with a single 2-inch plasma sputtering source utilizing water cooling, the coater efficiently manages temperature fluctuations. The vacuum chamber, constructed from high-purity quartz material and sized at φ180mm x 210mm, not only provides omnidirectional visibility through an observation window but also incorporates a removable top cover. Both upper and lower covers are robustly constructed from durable 304 stainless steel, enhancing the coater's longevity. The chamber interfaces seamlessly with a KF16 pumping port and a 1/4 inch ferrule connector for gas intake.
Power configurations include a single DC power supply with a maximum output power of 150W, supporting a sputtering power of 1200V and a maximum sputtering current of 50mA. The vacuum system is equipped with a dual-stage rotary vane vacuum pump, featuring KF16 pumping ports and exhaust interfaces. With a pumping rate of 1.1L/s (4m3/h), the system maintains an ultimate vacuum level of ≥0.1Pa, closely monitored through a resistance vacuum gauge. Operating on an AC 220V 50Hz power supply, the coater consumes a total power of 2kW. Its compact design, measuring 500mm x 320mm x 470mm and weighing 30kg, makes it a versatile solution for a wide range of research and industrial thin-film deposition applications. These comprehensive technical specifications emphasize the coater's capabilities and thoughtful design, ensuring precision and efficiency in coating processes.
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