Small double sputter source magnetron sputtering coater
MSP210S-RFD small dual-target magnetron sputtering coating equipment has been miniaturized, while retaining the high-vacuum stainless steel cavity, while simplifying other mechanisms, greatly reducing the installation site requirements.
Product Description
MSP210S-RFD small dual-target magnetron sputtering coater equipment has been miniaturized, while retaining the high-vacuum stainless steel cavity, while simplifying other mechanisms, greatly reducing the installation site requirements. The magnetron sputtering coater equipment is equipped with a DC power supply and an RF power supply. The DC target can be used for sputtering of metals and other conductive materials. The RF power supply can be used for sputtering of various non-metals and metal oxides. The equipment vacuum system adopts all imported vacuum pumps, with fast pumping speed, high ultimate vacuum and excellent vacuum performance. The equipment has compact structure, perfect functions and easy to use. It is very suitable for various coating tests. The technical parameters of the magnetron sputtering coater equipment provide a detailed overview of its capabilities and specifications. The sample stage features a size of φ150mm, offering adjustable rotating speeds ranging from 0 to 20 RPM and a heating capacity of up to 500℃. In terms of the magnetron sputtering target, the equipment is equipped with two 2-inch targets that share a baffle for enhanced functionality. The vacuum chamber, constructed from SS304 stainless steel, boasts dimensions of φ210mm in diameter and 230mm in height. It incorporates a φ40mm observation window and is accessible through a front door for convenient access. The vacuum system comprises an imported oil-free diaphragm pump as the mechanical pump with a KF16 pumping interface and an imported molecular pump with a KF40 pumping interface. The exhaust interface is also KF16. Vacuum measurement is facilitated through a combination of a resistance gauge and an ionization gauge, achieving an ultimate vacuum of 1.0E-3Pa. The pumping rate is 0.49L/s for the oil-free pump and an impressive 40L/s for the molecular pump. Power supply requirements specify AC 220V at 50/60Hz. The power configuration includes one DC power supply with a maximum output power of 500W and one RF power supply with a maximum output power of 500W. The overall size of the equipment is 550mm x 550mm x 1100mm, and it operates at a total power consumption of 2kW. These detailed technical specifications collectively define the capabilities and dimensions of the magnetron sputtering coater equipment, providing insight into its features and performance.