Six-source evaporation coater with single-station glove box

Export Six-source evaporation coater is mainly based on metal/organic source evaporation. It is suitable for the preparation of metal elements, oxides, dielectrics, semiconductor films, etc. in the laboratory. It can also be used for teaching and pre-process testing of production lines. , the expansion space is large, suitable for and meet the teaching and research work of colleges and universities. The basic structure: The coating equipment consists of vacuum chamber, metal/organic source system, sample stage system, vacuum pump set, film thickness monitor system, equipment rack, and electronic control system. The front door of the vacuum chamber can be connected to the glove box, and an integrated design scheme is adopted. The whole set of equipment is compact in structure and simple in layout, so as to avoid the messy appearance of experimental equipment. The Electron Beam Evaporation Coating Machine, model X-EIB500, offers a comprehensive set of technical parameters for efficient and precise operation. It features a high-quality 304 stainless steel D-shaped vacuum chamber with internal dimensions of D400*480mm, equipped with front and rear double doors for easy access, maintenance, and sample placement. The chamber includes multiple interfaces, such as metal and organic source interfaces, molecular pump interface, lighting interfaces, and film thickness probe interfaces, ensuring versatility in coating applications. The metal source system consists of two sets of water-cooled copper electrodes compatible with various evaporation boats and spiral wires. It includes pneumatic baffles and a 1KW DC constant current power supply for precise control. The organic source system comprises four sets of quartz boats, each with temperature control power supplies that offer a wide temperature range from RT~500°C. The sample stage system provides substrate rotation with adjustable speeds, electric lifting for substrate positioning (adjustable distance of 200~300mm), and a sample holder capable of accommodating 20*20mm substrates. An electric shutter is also included for convenience. The vacuum system consists of a molecular pump, rotary vane pump, high vacuum pneumatic gate valve, flapper valves, and a digital vacuum gauge, ensuring reliable vacuum performance. The film thickness monitor system features a three-channel quartz crystal film thickness monitor and water-cooled film thickness probes. The equipment rack is constructed from carbon steel square tubes with universal wheels and feet for mobility and stability. The electronic control system includes various power supplies for metal and organic sources, evaporation source baffle, quartz crystal film thickness monitor, sample table, and baffle, all controlled through a PLC system with a touch screen interface. Additional parameters include phase loss protection, misoperation protection, and one-key vacuum start and stop functions. The power supply operates on a ~220V two-phase power supply system, while cooling is provided by a small chiller with a cooling water temperature range of 5℃ to 35℃. Air supply is facilitated by a small oil-free silent air pump, and the ultimate vacuum level reaches 6×10-5Pa, with rapid evacuation from atmosphere to 6×10-4Pa in less than 35 minutes. Shutdown for 12 hours results in a vacuum degree of ≤10Pa. These comprehensive technical specifications make the X-EIB500 a versatile and reliable electron beam evaporation coating machine for various research and industrial applications.