Single-target RF magnetron sputtering coater MSP300S-RF
Magnetron sputtering coating equipment is a special laboratory coating instrument developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W.
Product Description
Our laboratory-developed magnetron sputtering coating equipment is a versatile solution designed to cater to various coating needs. This equipment can be equipped with both DC and RF power supplies, with power ranging from 500W to 1000W. Its applications span the preparation of single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, and optical films. In comparison to conventional plasma sputtering, magnetron sputtering stands out with its advantages of high energy, rapid speed, high deposition rate, and minimal sample temperature rise.
The magnetron target of this equipment features a water-cooled interlayer, efficiently dissipating heat and preventing the accumulation of heat on the target surface, ensuring stable and prolonged operation. The unit combines a compact design, achieving a harmonious balance between volume and performance, resulting in an aesthetically pleasing and functionally comprehensive apparatus. Its operation is seamlessly controlled via a user-friendly touch screen interface and a built-in one-button coating program, making it an ideal choice for thin film preparation in laboratory settings.
The single-target RF magnetron sputtering coater presents precise technical parameters to meet diverse coating demands. Operating on AC220V at 50Hz with a 6KW power capacity, it ensures stable performance and an ultimate vacuum level of 5x10-4Pa. The sample table accommodates φ150mm samples with a maximum heating temperature of 500℃ and temperature control accuracy of ±1℃. The adjustable rotational speed of the sample table, ranging from 1 to 20rpm, adds versatility to coating processes. Equipped with two 2-inch magnetron sputtering heads, efficiently cooled by a water-cooling system, and a dedicated water chiller, this coater maintains optimal conditions during operation. The stainless steel vacuum chamber, with dimensions of φ300mm x 340mm H, offers convenient monitoring through a φ100mm watch window and an open-type design for easy target replacement. Gas flow is controlled by a one-channel controller, and the vacuum generation is facilitated by a molecular pump system with a 600L/S pumping speed. The integrated quartz vibrating film thickness gauge provides precise measurements during coating. The RF power supply, with a capacity of 500W, caters to the deposition of non-metallic films. Operated through an all-in-one computer interface, this coater measures 1090mm x 900mm x 1250mm, weighing 350kg, making it a substantial yet manageable tool for various coating applications in laboratories and industries. These detailed specifications position the single-target RF magnetron sputtering coater as a versatile and reliable solution for precision coating requirements.
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