Single target DC magnetron sputtering coater MSP300S-DC
Single sputter source magnetron sputtering coater is a special laboratory coating machine developed by our company. The equipment can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
Product Description
Introducing our Magnetron Sputtering Coating Equipment, a specialized laboratory machine meticulously developed to meet diverse coating needs. This versatile equipment accommodates both DC and RF power supplies, providing a power range from 500W to 1000W. Its capabilities extend to the preparation of various thin films, including single or multilayer ferroelectric, conductive, alloy, semiconductor, ceramic, dielectric, and optical films. Noteworthy advantages over conventional plasma sputtering include high energy, rapid deposition rates, and minimal sample temperature elevation. The magnetron target, featuring a water-cooled interlayer, ensures stable, prolonged operation by effectively dissipating heat and preventing accumulation on the target surface.
The single-target DC magnetron sputtering coater embodies a refined balance of volume and performance, resulting in an aesthetically pleasing design with comprehensive functionality. Operated through a user-friendly touch screen interface and a built-in one-button coating program, it proves to be an ideal choice for thin film preparation in laboratory settings. Powered by AC220V at 50Hz, with a total power capacity of 6KW, this coater achieves an ultimate vacuum of 5x10-4Pa, demonstrating efficiency in maintaining optimal vacuum conditions. The sample table, sized at φ150mm, accommodates diverse sample placements, offering a maximum heating temperature of 500℃ with precise temperature control accuracy of ±1℃. Adjustable rotation speeds from 1 to 20rpm enhance flexibility for various coating requirements.
The coater's magnetron sputtering head configuration includes a 2-inch head efficiently cooled by a water-cooling system, ensuring consistent and reliable performance. A dedicated water chiller supports this cooling process, contributing to effective heat dissipation. The vacuum chamber, constructed from high-quality SUS material, features a φ100mm watch window for observation and adopts an open-type design for simplified target replacement. For precise gas control, the coater incorporates a one-channel gas flow controller with a 200sccm capacity for argon (Ar) gas. The vacuum pump system relies on a molecular pump with a high pumping speed of 600L/S.
Additional features include a quartz vibrating film thickness gauge, offering precise measurements with a 0.10 angstrom resolution for accurate monitoring during the coating process. The coater's sputter power source comprises a 500W DC power supply, making it suitable for metal film preparation. Operation is facilitated through an all-in-one computer interface, providing a seamless control and monitoring platform. With dimensions of 1090mm x 900mm x 1250mm and a weight of 350kg, this coater combines stability and ease of integration, establishing it as a reliable tool for advanced coating applications.
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