Single target DC magnetron sputtering coater
Single target DC magnetron sputtering coater can be used to prepare single-layer ferroelectric films, conductive films, alloy films, etc. Compared with similar equipment, this single-target magnetron sputtering coating instrument is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material thin films, and is especially suitable for laboratory research on solid electrolytes and OLED etc.
Product Description
Presenting the Single-target DC Magnetron Sputtering Coating Instrument, a meticulously engineered system designed to deliver precise thin-film deposition. This cost-effective equipment, developed independently by our company, embodies a standardized, modular, and customizable design. Magnetron targets, available in 1 inch, 2 inches, and 3 inches, offer flexibility, allowing customers to select based on the size of the plated substrate. The instrument incorporates a robust 1500W high-power DC power supply, enabling high-energy metal sputtering coating. Tailoring to experimental needs, customers can opt for DC or RF power supplies of varying specifications to facilitate coating operations for diverse materials.
Equipped with two high-precision mass flow meters, the instrument supports customization of up to four mass flow meters, meeting requirements for complex gas environment construction. The standard inclusion of an advanced turbomolecular pump ensures an ultimate vacuum reaching 1.0E-5Pa, with the option to purchase other types of molecular pumps. The molecular pump's gas path is efficiently controlled by multiple solenoid valves, enabling sample retrieval without disrupting pump operation, significantly enhancing work efficiency. For streamlined control, the product can be equipped with an integrated industrial control computer, facilitating functions such as the management of the vacuum pump group and sputtering power supply control, thereby optimizing experimental efficiency.
The instrument's sample stage, with dimensions of φ185mm, supports heating from room temperature to 500℃ and offers adjustable speeds from 1 to 20rpm. The circular plane target gun operates within a sputtering vacuum range of 10Pa to 0.2Pa, accommodating various target diameters and thicknesses. Ensuring safety with an insulation voltage exceeding 2000V, the system features a polished 304 stainless steel cavity with a quartz observation window. The gas control system, featuring a mass flow meter for precise argon gas flow control and normally closed solenoid valves, operates with accuracy within a specified temperature range. The DC power supply, delivering 500W of power with an output voltage range of 0-600V, facilitates effective coating processes, while the film thickness measurement component ensures accuracy within a broad range. Supported by air-cooling and efficient cooling water management, this instrument emerges as a comprehensive solution for advanced thin-film deposition applications.
Disclaimer: The information presented on this website, including product images, product descriptions, and technical parameters, serves as a reference guide. Please note that due to potential delays in updates, discrepancies may exist between the content displayed here and the current product status. We encourage you to reach out to our dedicated sales team to verify the most up-to-date details. It is important to understand that the information provided on this site does not constitute a formal offer or commitment, and our company reserves the right to periodically enhance and amend website information without prior notice. We appreciate your understanding in this regard.