RTP rapid annealing furnace O1000-100I-T-RTP
This product is a rapid annealing furnace, heated by the halogen lamp, and can be used for rapid thermal annealing, rapid thermal oxidation, rapid thermal nitriding, silicidation, diffusion, compound semiconductor annealing, annealing after ion implantation, electrode alloying, crystallization and Densification, alloy melting point analysis, film deposition, etc.
Product Description
The comprehensive design of this equipment seamlessly integrates a quartz vacuum chamber, vacuum pump unit, water cooling unit, and an advanced control system. The control system stands out for its utilization of intelligent temperature control meter control and a user-friendly touch screen interface. Offering a digital parameter interface and an automatic operation mode, it provides a robust platform for research and development activities. The furnace chamber introduces a left-right sliding mechanism, allowing for flexible adjustment of the distance from the sample, enhancing adaptability in experimental setups. A dual-stage rotary vane pump, prized for its compact size, low noise, and absence of oil pollution, ensures efficient vacuum operation.
The O1000-100I-T-RTP model represents a pinnacle in high-temperature rapid thermal processing (RTP) tube furnaces, distinguished by specific technical parameters. Constructed with a high-purity quartz tube boasting an inner diameter of 100mm, a heating temperature zone extending 400mm, and an overall length of 550mm, this furnace is tailored for demanding high-temperature applications. Its remarkable heating rate, ranging from 0 to 200℃ per second, and efficient cooling within 25 minutes when temperatures exceed 200℃, showcase its prowess. Halogen lamps serve as precise heating elements within the furnace, contributing to the meticulous temperature control it achieves.
The furnace is thoughtfully equipped with a KF16 vacuum interface and a pagoda head intake port featuring a 10mm outer diameter air hose. Its flange specification includes a φ100 stainless steel vacuum method water cooling flange with a φ10mm quick plug connector, ensuring effective and efficient cooling. The vacuum system incorporates a dual-stage rotary vane pump with a pumping speed of 1.1L/s, achieving an ultimate vacuum level of 10-1Pa. Temperature control is entrusted to an intelligent temperature control meter, incorporating over-temperature protection and relying on K-type thermocouples for precise temperature measurement.
The cooling system integrates a water chiller with a 9L water tank capacity and a maximum lift head of 10m, featuring a φ10 Pagoda Head intake port and a manual air release valve. Power requirements for this advanced furnace are 220V at 50Hz, with a power rating of 24kW. Despite its powerful capabilities, the furnace maintains a compact footprint, measuring 1200mm in length, 500mm in width, and 480mm in height. This design ensures both efficiency and versatility in high-temperature processing applications.
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