RF plasma magnetron sputtering coater for non-conductive thin films
RF plasma magnetron sputtering coater is a compact 2" single head RF Plasma magnetron sputtering system coating non-metallic, mainly oxide thin film. It integrates all components into one-floor stand cabinet, including RF power source, quartz vacuum chamber, vacuum pump, recirculation water chiller and film thickness monitor etc.
Product Description
Introducing our RF Plasma Magnetron Sputtering Coater, an excellent and cost-effective solution tailored for coating thin films of non-conductive materials. This compact coater, known for its simplicity, efficiency, and space-saving design, is widely used in the laboratories of major universities and research institutes, proving its versatility in various applications.
Operating on a 220 VAC power supply at 50/60Hz, single phase, this coater boasts a total power consumption of 800 W, inclusive of the pump. For scenarios requiring a 110 VAC voltage, a 1000 W transformer is recommended for optimal performance. The coater is equipped with a 13.5 MHz, 300 W RF Generator featuring an automatic matching function built into the cabinet. Connected to a 2" sputtering head, this setup ensures precise and efficient performance.
The sputtering head, featuring water cooling jackets, is inserted into the quartz chamber using a quick clamp mechanism for easy operation. A manually operated shutter on the flange provides additional control over the coating process. To maintain optimal temperature, a digitally controlled recirculation water chiller with a flow rate of 16 L/min is installed in the bottom cabinet.
The coater package includes a SiO2 target for demonstration purposes, with the sputtering target required to have a size of 2" in diameter and a maximum thickness of 1/4". The vacuum chamber, constructed from high-purity quartz, ensures airtightness with its aluminum sealing flange and high-temperature silicone O-ring. A stainless steel mesh cover shields the chamber from RF radiation.
Achieving a vacuum level of 1.0E-2 Torr with the included dual-stage mechanical pump and 1.0E-5 Torr with an optional turbo pump, this coater provides efficient evacuation capabilities. The rotatable and heatable sample holder, crafted from a ceramic heater with a stainless steel cover, accommodates samples up to 50 mm in diameter, including 2" wafers. Adjustable rotation speeds ranging from 1 to 10 rpm ensure uniform coating, with temperature control adjustable from room temperature to a maximum of 400°C, controlled via a digital temperature controller.
For vacuum operation, a KF25 vacuum port is integrated to connect to a vacuum pump. The included dual-stage mechanical pump achieves a vacuum level of 1.0E-2 Torr. The coater's dimensions are 650 mm in length, 650 mm in width, and 1630 mm in height, with a net weight of 70 kg, making it relatively compact and lightweight.
Backed by a one-year limited warranty and lifetime support, our RF Plasma Magnetron Sputtering Coater ensures reliable performance, providing peace of mind for users in their research and coating endeavors.
Disclaimer: The information presented on this website, including product images, product descriptions, and technical parameters, serves as a reference guide. Please note that due to potential delays in updates, discrepancies may exist between the content displayed here and the current product status. We encourage you to reach out to our dedicated sales team to verify the most up-to-date details. It is important to understand that the information provided on this site does not constitute a formal offer or commitment, and our company reserves the right to periodically enhance and amend website information without prior notice. We appreciate your understanding in this regard.