Rapid annealing furnace
RTP rapid annealing furnace is a powerful heating device independently developed by our company. The product adopts imported infrared heating tube heating, reasonable novel structure, furnace body and furnace tube can slide freely, and can achieve rapid temperature rise and fall. The size of the furnace tube is 120mm, and 4 inches of material can be placed directly. The sample reaction zone is located in a closed quartz cavity. While completing the production process, it also greatly reduces the possibility of indirect contamination of the sample.
Product Description
The R1000-200IT furnace stands out as a versatile and technologically advanced solution designed to cater to diverse thermal processing needs. Boasting a double-shell structure and a high-precision mobile platform, this furnace prioritizes precision and versatility. Constructed from high-quality and high-purity alumina polycrystalline fiber, the furnace body ensures excellent insulation performance. The furnace tube, crafted from high-purity quartz, provides an effective sample space of 8 inches within its dimensions of φ210*650mm, while a stainless steel fast extrusion sealing flange ensures efficient sealing.
This furnace incorporates a range of user-friendly features, including a 7-inch touch screen with a graphical interface for seamless data input and operation. The high-precision mobile platform guarantees smooth and jitter-free movement, enhancing overall functionality. The furnace tube's flexible design and secure buckle-fastened sealing flange facilitate quick and convenient material placement and retrieval while minimizing the risk of air leakage and potential damage to the heating tube during flange installation. Notably, the furnace allows for rapid sample cooling when the furnace tube is removed, meeting the demands for quenching and sudden heat treatment experiments.
The advanced temperature control system, featuring artificial intelligence adjustment technology, PID adjustment, and programmable heating and cooling procedures, ensures precise temperature control with an accuracy of within 1°C. The LCD touch screen display enhances user-friendly operation, and the furnace's heating capabilities are powered by imported infrared tubes, reaching a maximum temperature of 1050°C with a continuous working temperature of up to 1000°C. Rapid cooling within 25 minutes at temperatures exceeding 200°C is achievable, further demonstrating its efficiency.
Designed primarily for semiconductor device research, development, and production, the R1000-200IT furnace excels in rapid annealing after ion implantation, rapid ohmic contact alloys, annealing of silicide alloys, oxide growth, and rapid heat treatment processes. The furnace is equipped with over-temperature alarms, power protection, and leakage protection for added safety during operation. Its connectivity features, such as the reserved 485 conversion interface, enable connection to a computer for remote control, real-time tracking, historical data recording, and report generation.
The furnace's technical specifications, including its dimensions, weight, power supply, and configurable systems for vacuum and gas supply, underscore its adaptability and reliability as a versatile solution for various thermal processing applications.
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