Programmable single chamber magnetron sputtering coater
Programmable single chamber magnetron sputtering coater is widely used in semiconductor, LED, photovoltaic and other industries. It is mainly used for the preparation of various metal, semiconductor and dielectric materials thin film, and can meet the needs of scientific research and small batch production.
Product Description
The Programmable Single Chamber Magnetron Sputtering Coater is meticulously designed with a single-chamber structure, featuring a comprehensive array of components such as the sputtering vacuum chamber, magnetron sputtering target, ion bombardment, revolution substrate, optical heating system, sputtering power supply, working gas path, vacuum acquisition system, installation machine, vacuum measurement, water cooling, alarm system, and control system. Controlled by both IPC and PLC, the system offers seamless operation through automatic and manual modes, all conveniently managed on the intuitive touch screen. With man-machine operation interfaces like the vacuum system, sputtering process setting, and filling and venting system, users can effortlessly control various parameters and implement procedure processes.
This advanced coater showcases exceptional specifications, featuring a sputtering chamber vacuum limit of ≤8.0×10⁻⁶Pa and an impressive vacuum recovery, pumping from atmosphere to 1.0×10⁻³ Pa within a mere 15 minutes. Ensuring outstanding uniformity, the system maintains film thickness nonuniformity ≤±5%, nonuniformity between slices ≤±5%, and inhomogeneity between batches ≤±5%. The cylindrical sputtering vacuum chamber, sized at 800mm x 250mm, accommodates four 6-inch permanent magnet targets powered by an imported power supply, offering both rf and dc pulse options. The sputtering rate achieves a versatile range of 0.5 to 5 angstroms per second for materials like aluminum. The revolution base plate supports six 6-inch substrates, with adjustable revolution speeds from 3 to 15 revolutions per minute. The integration of a light heating system allows for sample heating temperatures from room temperature to 250℃, maintaining precise temperature control.
The comprehensive system includes a working gas channel with 2-channel mass flow controllers (MFC) and a gas pump composition featuring a cryopump (imported), Roots dry pump set, imported air gate valve, and pipes. Vacuum measurement is achieved with precision through two imported vacuum gauges, visually displayed on the industrial computer's touch screen. The entire system is efficiently controlled, occupying a floor space of 1500×1000mm² for the main set and a compact 700×700mm² for the electric control cabinet.
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