PLD pulsed laser deposition equipment
1. Equipment function The PLD series equipment is mainly used to grow optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, especially suitable for the growth of complex layered superlattice thin film materials with high melting point, multi-element and containing gas elements. 2. Equipment overview The equipment can be divided into five parts according to the appearance structure: PLD deposition chamber, vacuum measurement system, vacuum pumping system, workbench, and electric control cabinet.
Product Description
The PLD deposition chamber exhibits a robust design with a spherical vacuum chamber structure made of 1Cr18Ni9Ti stainless steel material, featuring a diameter of Φ450mm. The chamber undergoes precise construction through argon arc welding and a surface spray glass shot matte treatment for enhanced durability. Its vacuum leakage rate is impressively low, measuring less than 5.0×10-8Pa.I/S. Sealing is achieved through metal gaskets or fluorine rubber rings, and the work surface houses a Φ220 cylinder below the vacuum chamber, connected to a CF150 knife-edge flange and manual gate valve. The chamber supports connectivity to the 620 molecular pump system via a CF150 bypass pipe assembly.
The observation window on the vacuum chamber's front, sealed with a rubber ring, facilitates sample entry, target material replacement, and maintenance. Adjacent to the observation window, a rotating target platform is installed on the left, while a sample heating table is positioned directly opposite. Two incident observation windows with infrared and ultraviolet quartz are arranged at a 135° angle on the same horizontal plane as the rotating target platform. Above the vacuum chamber, operation and test observation windows, each with a diameter of Φ100mm, provide additional versatility. The chamber body integrates essential components such as resistance gauge, ionization gauge, KF40 manual pre-pumping angle valve, Φ10 manual vent valve, and CF35 baking lighting electrode.
The rotating target stage accommodates four targets simultaneously, each with a size range of Φ60mm to Φ25mm. Target materials can self-rotate at an adjustable speed of 5-50 rpm, controlled by a magnetic coupling mechanism driven by a stepper motor. The target position revolution transposition mechanism prevents cross-contamination between targets. The sample heating stage supports substrates up to Φ60mm, offering a maximum heating temperature of 800℃ controlled by thermocouple closed-loop feedback. The substrate can rotate continuously at a speed of 5-50 rpm, and the distance between the target and substrate is adjustable between 20-80mm.
The vacuum pumping system includes a KYKY-160/620 molecular pump, a 2XZ-8B mechanical pump, and other components for efficient vacuum performance. The chamber's vacuum measurement system consists of direct insertion resistance gauges and metal ionization gauges, measuring the vacuum degree from atmosphere to 2x10-5Pa. The workbench, electric control cabinet, and associated components contribute to the overall functionality of the PLD deposition chamber, providing precise control and monitoring capabilities for diverse applications.
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