PECVD Plasma enhanced chemical vapor deposition coating equipment
PECVD-450 film coating machine adopts plasma enhanced chemical vapor deposition technology, which can use high-energy plasma to promote the reaction process, effectively increase the reaction speed and reduce the reaction temperature.
Product Description
The PECVD-450 model, a cutting-edge PECVD film coating equipment, stands as a versatile solution for depositing thin films on diverse substrates such as optical glass, silicon, quartz, and stainless steel. Tailored for precision, it excels in coating silicon nitride, amorphous silicon, and microcrystalline silicon, offering high film-forming quality with minimal pinholes and a remarkable resistance to cracking. This makes it particularly adept for the preparation of thin film solar cell devices, specifically in the production of amorphous silicon and microcrystalline silicon films.
Designed for scientific research and small batch material preparation in educational institutions and research institutes, the PECVD-450 features a meticulously engineered vacuum chamber. With a front-opening door and a φ300mm diameter combined with a 300mm height, the stainless steel chamber boasts a φ100mm viewing window equipped with a baffle for efficient observation. The vacuum system is optimized with a rotary vane pump achieving a pumping speed of 1.1L/s as a backing pump, and a Turbo molecular pump with a pumping speed of 600L/s as a secondary pump. This configuration ensures an ultimate vacuum level of 1.0E-6Pa, reached within 30 minutes, or 1.0E-4Pa at an impressive speed.
For precise deposition, the vacuum can be finely adjusted within the 0.133 to 133Pa range, catering to specific coating requirements. The RF power supply, operating at 13.56MHz with a power output of 500W, incorporates an automated matching mechanism for optimal performance. Flow control is facilitated through a mass flowmeter, defaulting to argon (Ar) gas with a flow range of 0 to 200sccm. Compact yet powerful, the equipment measures 1100mm in length, 800mm in width, and 1100mm in height, offering a robust solution for PECVD film coating applications in scientific research and small-scale material preparation settings.
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