MPCVD single crystal diamond deposition equipment

Suitable applications: Preparation of High Quality Single Crystal Diamond by Chemical Vapor Deposition Preparation of high-quality polycrystalline diamond self-supporting thick films by chemical vapor deposition Preparation of High Quality Polycrystalline Diamond Thin Films by Chemical Vapor Deposition Preparation of various carbon nanofilms such as graphene, carbon nanotubes, fullerenes and diamond films by chemical vapor deposition Features: This product is a stainless steel cavity type 6kw microwave plasma equipment with high power density; Water-cooled substrate stage and water-cooled metal reflection chamber ensure that the system can work stably for a long time; The substrate temperature is achieved by microwave plasma self-heating; The vacuum measuring instrument adopts a full-scale vacuum gauge, which can accurately measure the background vacuum and working gas pressure; The vacuum pump and valve use turbo molecular pump (the ultimate vacuum is 1×10-5Pa) and rotary vane mechanical vacuum pump (the ultimate vacuum is 1Pa), and the system can automatically control the deposition pressure; Equipped with cooling water circulation system to ensure long-term safe and stable operation of the device under high power; The system has a 15-inch touch screen, PLC automatic control, constant temperature or air pressure can be set, and up to 20 sets of process files can be saved and reused; Fully automatic process control module for stable and reliable preparation of high-quality diamond films and crystals The project encompasses a range of specifications and characteristics aimed at configuring the main control unit. This configuration is orchestrated through PLC automatic program control, utilizing a 6kw 2.45Ghz microwave source, with power generated through a microwave generator. The microwave transmission occurs within a waveguide featuring three pins, complemented by a 6kw mode converter and resonant cavity. Additionally, a cylindrical water cooling chamber, equipped with a φ70mm abutment, ensures efficient heat dissipation. Electric lift functionality is integrated into the system, facilitating adjustments as needed. The fundamental parameters of diamond growth are also a key consideration, with provisions for 7x7mm (37 pieces), 8x8mm (29 pieces), 9x9mm (21 pieces), and 10x10mm (13 pieces) growth configurations. Furthermore, the system incorporates a 5-way MFC (Proton Flow Meter) for precise control over the flow rates of various gases, including CH4, H2, N2, Ar, and O2, within the range of 0-500sccm. Temperature measurement relies on a high-precision infrared thermometer, ensuring accurate monitoring. Vacuum conditions are maintained and monitored through the use of a high-precision vacuum gauge, in conjunction with the option of a molecular pump, which can be either included or omitted based on requirements. Additionally, hydrogen purification of 9N class is attainable within this system. To maintain optimal operating conditions, a 3P water cooler is employed to regulate the water cycle, enhancing the system's efficiency and reliability.