MPCVD Diamond Growing Machine
Product Description
The system is anchored by a robust 10 kW SAIREM microwave generator featuring a 2.45GHz magnetron microwave frequency. Essential components such as a circulator, isolator, and an auto-operated EH-tuning element ensure the system's efficient operation. The plasma source, a 6" plasma source with a versatile 2.45GHz excitation frequency, operates across a spectrum of Low to High Power Density Plasma conditions. Its standout feature lies in unique temperature control capabilities at high power densities, enabling gas inlet into the chamber from the underside, complemented by a bias electrode for added flexibility.
The substrate holder stands out for its design flexibility, equipped with an exchangeable holder featuring a cooling element (approximately D75mm) and a replaceable holder plate for convenient cleaning and maintenance. Utilizing Molybdenum plasma contacting parts, the holder incorporates automatic height adjustment during growth processes. The chamber's clamshell lid design ensures easy access for substrate placement and cleaning, with a water-cooled aluminum alloy structure for efficient heat dissipation.
The gas management system is comprehensive, integrating five gas lines and five mass flow controllers (with customization options available). It includes a pressure controller spanning the range of 100-300mbar. The vacuum system employs a turbo molecular pump and a dry primary pump in tandem to achieve the necessary vacuum conditions. Control and operation are facilitated by a computer controller, enabling recipe-driven operations, remote control, detection, and system upgrades. Optionally, a substrate camera enhances monitoring capabilities, while the system incorporates a pyrometer with a temperature range of 400-1700°C for precise control of substrate temperatures during CVD processes.
Offering versatility in rough diamond production, the system is configured into four options, each accommodating a different number of seeds and yielding distinct carat outputs per cycle and 14-day periods. The choice of configuration depends on specific production needs, ensuring flexibility in meeting varying capacity requirements. All configurations consistently produce diamonds falling within the D/E/F/G color range and maintain a clarity grade of VS2+ before undergoing the HPHT treatment. This system stands as a reliable and flexible solution for advanced rough diamond production.
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