Medium plasma cleaner with vacuum pump
Medium plasma cleaner has a 6" DiaĆ6.5"Length quartz chamber. It is designed to clean and remove nano-scale organic contamination on the substrate or wafer up to 4" using air, oxygen, or argon plasma.The rate of organic removal is about 20 nm/min Maximum at high RF power.
Product Description
The Medium Plasma Cleaner offers a range of key features that enhance its usability and effectiveness. Through the control panel, users can easily manage critical parameters such as RF power, vacuum pump operation, and cleaning duration, providing precise control over the cleaning process. Important information, including time, power, and vacuum levels, is displayed on a set of 4-digit digital tubes, ensuring real-time monitoring and accuracy. The inclusion of a three-way valve allows for precise control of the intake air flow, ensuring consistent and reliable performance. Additionally, the cleaner features a spacious cleaning cavity with a large airflow, while the air inlet interface is a 6mm ferrule interface, making it adaptable for various applications. To further enhance its capabilities, the Medium Plasma Cleaner is equipped with high-power RF power equipment, enabling plasma etching and plasma ashing experiments with efficiency and precision. These features collectively position the Medium Plasma Cleaner as a valuable tool for a wide range of laboratory and research applications, offering control and flexibility in plasma treatments. The Medium Plasma Cleaner is equipped with a set of specifications designed to ensure its efficient and versatile operation. It operates on an input power supply of AC 220V at 50/60 Hz, with a maximum RF power output of 30W. The vacuum pump consumes less than 500W, resulting in a total power consumption of less than 600W. The RF power is adjustable at three levels, allowing for flexibility in plasma cleaning applications: Low Setting at 7.2W, Medium Setting at 10.2W, and High Setting at 30W. The RF frequency is set at 3 MHz, ensuring efficient and precise plasma generation. The control panel offers intuitive control functions, including the adjustment of cleaning time, RF power, and vacuum pump operation, providing users with convenient and accurate control over the cleaning process. The plasma chamber boasts a 6" diameter and 6.5" length quartz chamber with a 3-liter capacity. It features a hinged-type door with a viewing window for easy sample loading and observation during cleaning. The equipment includes a Double Stage Rotary Vane Vacuum Pump with a flow rate of 156 L/m, along with an exhaust filter and vacuum pipe. It is compatible with both 110V and 220V power supplies, providing flexibility for different user needs. For plasma cleaning, a variety of inert gases such as N2, Ar, Air, and Mixed gas can be chosen, depending on the material to be treated. It is important to note that no flammable gases should be used with the plasma cleaner for safety reasons. In terms of dimensions, the Medium Plasma Cleaner measures 400mm in length, 300mm in width, and 300mm in height, which is equivalent to 16" × 12" × 12" in inches. It has a net weight of 30lbs, making it manageable and suitable for laboratory and research environments. The equipment comes with a one-year limited warranty and lifetime support, excluding the Pyrex glass chamber. It's important to note that positive pressure may damage the Plasma Quartz Chamber, requiring careful consideration during operation.