Low Vacuum Laboratory Mini CVD Tube Furnace with Three Gas Channels
The 1200CVD is a desktop tube furnace designed for laboratory applications. It features a high-purity quartz tube and an alumina fiber chamber, making it suitable for various heating processes. The furnace is equipped with a K-type thermocouple for accurate temperature monitoring and control. With a single heating zone, it can achieve a temperature accuracy of +/-1°C. The heating element is constructed from resistance wire, ensuring efficient and reliable heating. Certified with CE and TUV, this heating-type furnace adheres to quality and safety standards. It comes with an OD of 60mm and is designed for school laboratory use. The furnace is packaged securely in a wooden box for transport and storage. Its robust structure and specifications make it a valuable tool for laboratory heating and thermal processing applications.
Product Description
Introducing the mini CVD tube furnace, an integral component of the 1200CVD series furnace workstation, this system provides a comprehensive solution for diverse thermal processes. Comprising the O1200 series mini tube furnace, a precision mass flow gas control station, a high vacuum station, and various assembling parts, the workstation offers a versatile environment for experimentation. With a maximum working temperature of 1200°C and an ultimate vacuum rate of 10^-5 torr, this system caters to applications such as Chemical Vapor Deposition (CVD), diffusion, and other thermo-treatments under vacuum conditions.
Central to this workstation is the mass flow gas control station, a critical element that adeptly blends three different gases, delivering the combined gas into a fused quartz tube within the furnace. This precise gas control mechanism ensures reliable execution of various research and testing procedures, enhancing the system's adaptability for diverse applications.
The 1200CVD system, featuring a split-chamber design with an LED digital display for precise control, employs alumina fiber for the chamber and resistance wire as the heating element. Capable of reaching a maximum temperature of 1200°C (recommended usable range up to 1100°C) with a heating rate of up to 20°C (suggested at 10°C/min), this single-zone system offers efficient operation. With a heated length of 220mm and a 100mm constant temperature zone, precise control is maintained. The high-purity quartz tube, measuring Φ50mm x 700mm, ensures a controlled environment with a vacuum seal reaching 1.03×10^-3Pa.
Temperature control is achieved through PID automatic control via SCR power control, ensuring accuracy within ±1°C. The system includes preset curve options with ten profiles, monitored by a K-type thermocouple. Operating at 220V, 50Hz-60Hz, with a maximum power of 1.8KW, the system features three customizable gas channels controlled by Mass Flow Controllers (MFCS) with a range of 0 - 500 sccm. The vacuum pump offers both rotary and high vacuum pumping, reaching 10 Pa and 10^-4 Pa, respectively.
In summary, this comprehensive mini CVD tube furnace system provides precise control and monitoring, making it ideal for a diverse range of applications, including Chemical Vapor Deposition (CVD) and various thermal treatments.
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