Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-600-2HD

Revolutionize your coating processes with our state-of-the-art Advanced Sputtering Coater System. Designed for precision and efficiency, this system operates on 220VAC, 50/60Hz, single-phase power, boasting a total consumption of 2000W, inclusive of the pump.

Equipped with dual power sources, it seamlessly integrates a 500W DC source for metallic coatings and a 600W RF source with automatching for non-metallic materials. Customizable configurations are available, including an optional Compact 300 RF source at an additional cost, providing flexibility tailored to your needs.

The heart of the system lies in its two 2" Magnetron Sputtering Heads, each fitted with water cooling jackets. One head connects to an RF power supply for non-conductive materials, while the other interfaces with a DC sputtering power source for metallic coatings. Versatility is key, accommodating 2" diameter targets with a thickness range of 0.1 - 5 mm for both metallic and non-conductive targets.

Crafted from stainless steel, the vacuum chamber boasts dimensions of 300 mm Dia x 300 mm Height. Real-time monitoring is facilitated by a 100 mm Dia observation window, providing a window into your coating processes.

The sample holder adds to the system's adaptability, supporting sizes up to 140 mm in diameter for 4" wafers. Adjustable rotation speeds ranging from 1 to 20 rpm ensure uniform coating. Temperature control of the holder spans from room temperature to a maximum of 500°C, with an impressive accuracy of +/- 1.0 °C.

Effortlessly manage your coating parameters through the 6" touch screen control panel, allowing gas flow adjustments with a maximum rate of 200 ml/min. The vacuum system includes a high-speed turbo vacuum pump, reaching a maximum vacuum level of 10^-6 torr with chamber baking. A dual-stage mechanical pump enhances pumping speed, coupled with a mobile pump station for added convenience.

Monitoring coating thickness is simplified with the built-in precision quartz thickness sensor, boasting a remarkable accuracy of 0.10 Å. An LED Display Unit outside the chamber provides real-time information on coating thickness and speed, with a comprehensive database for reference.

The system's overall dimensions are L6600mm x W660mm x H1200mm, with a net weight of 160 kg. It comes with a one-year limited warranty and lifetime support, ensuring your investment is backed by reliability.

For optimal performance, the system recommends using a 5% Hydrogen + 95% Nitrogen gas mixture to remove oxygen from the chamber and >5N purity Argon gas for plasma sputtering. Elevate your coating processes with our Advanced Sputtering Coater System—precision and innovation in every layer.


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