Laboratory cvd mos2 thin film preparation sliding two zone rtp tube furnace O1200-50IIC-RTP
The laboratory CVD MoS2 thin film preparation sliding two-zone RTP tube furnace, designated as O1200-50IIC-RTP, is a versatile system designed for a range of applications in materials research and development. This furnace is commonly used for rapid thermal annealing and ion implantation annealing processes. It also excels in graphene chemical vapor deposition (CVD) preparation and carbon nanotube growth. Moreover, the system facilitates rapid thermal oxidation and nitriding for materials modification.
Product Description
Designed for diverse thermal processing applications such as silicidation, diffusion, contact alloying, crystallization, and densification, the O1200-50IIC-RTP laboratory CVD MoS2 thin film preparation sliding two-zone RTP tube furnace stands out as a crucial tool in scientific research and materials science. Its dual heating zones, precision temperature control, and adaptable design make it an indispensable asset in laboratory environments, catering to a spectrum of thermal processing requirements.
Specifically tailored for the production of high-quality MoS2 thin films, this furnace ensures precise and controlled thermal processing. Equipped with two separately LED digital gauges, it facilitates accurate temperature monitoring, with a limiting temperature reaching 1150°C and a versatile working temperature of up to 1100°C. The furnace features a two-segment heating zone, each 200mm in length, complemented by a 200mm constant temperature zone. The quartz tube, with a diameter of OD50*1200mm, accommodates diverse materials and sample sizes, enhancing its versatility. Temperature accuracy is rigorously maintained within ±1°C, guaranteeing reliable and consistent results.
Utilizing an Alchrome heating element and a K-type thermal couple for precise temperature measurement, the furnace incorporates safety measures such as alarms to prevent overheating or overcurrent issues. Its double-layer structure, coupled with fan cooling, ensures efficient heat dissipation. Temperature control, programmable with 30 steps, is achieved through a PID control system. The chamber, constructed from alumina fiber, features a stainless steel vacuum flange for secure sealing. Air-forced cooling further enhances the cooling process, and the furnace includes a gas mixer with a Float Flow Controller for precise gas control.
Operating at a main power of 4.5kW and a working voltage of AC220V, 50Hz, this laboratory CVD MoS2 thin film preparation furnace addresses the intricate thermal processing needs of materials science and research. With its advanced features and robust design, it emerges as a valuable tool, supporting the quest for precision and innovation in laboratory settings.
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