Laboratory CVD Furnace with water cooling flange and two gas way mixer O1200-50IT-2Z10V

SKU: MND-134461
Model: O1200-50IT-2Z10V

O1200-50IT-2Z10V is a laboratory cvd furnace composed by one 1200℃ tube furnace with water cooling system, a two way gas mixer, and rotary vacuum pump. It is designed for laboratory thin film preparation, such as: graphene, MoS2, Nanotube and etc

 Product Description

The O1200-50IT-2Z10V model stands out with its user-friendly LCD Touch Panel, providing seamless and precise control over its advanced features. With a maximum limiting temperature of 1200℃, this system ensures efficient and reliable operation, maintaining a working temperature of up to 1100℃. The adjustable heating rate, ranging from 0-20℃/min, adds a layer of flexibility to accommodate diverse applications. Its heating zone, spanning a length of 440mm, is complemented by a 200mm constant temperature zone, catering to specific process requirements. The quartz tube, with a standard diameter of OD50*1000mm, can be optionally replaced with tubes of 60mm, 80mm, 100mm, or 120mm to suit specific needs, providing versatility in experimentation.

 

Impressively accurate with a temperature accuracy of ±1℃, the system's heating element, made of Fe-Cr-Al alloy with molybdenum reinforcement, ensures precision in temperature measurement through a K-type thermocouple. The double-layer cooling structure with fan cooling efficiently maintains temperature control, while a 30-step programmable PID control system enables advanced temperature regulation. The chamber, constructed from durable alumina fiber, ensures longevity and reliability. Safety is a priority with incorporated over-temperature and over-current alarms. The sealing flange, equipped with a water cooling system made of stainless steel vacuum flange, adds an extra layer of security. The system includes a mechanical rotary vacuum pump for enhanced vacuum capabilities, with air cooling as the chosen method and a stainless steel bellows connection pipe featuring a manual flap valve for controlled gas flow.

 

The gas mixer, with a two-way configuration, showcases high accuracy with a range of ±2% F.S., repeat accuracy of ±0.2% FS, and linear precision within ±1% F.S. Operating under working pressures ranging from -0.1MPa to 0.15MPa, the system is powered by AC220V, 50Hz, ensuring adaptability to standard power configurations. This comprehensive system offers a seamless integration of advanced features, making it a valuable asset for precise and controlled laboratory experiments.

 

 

 

Disclaimer: The information presented on this website, including product images, product descriptions, and technical parameters, serves as a reference guide. Please note that due to potential delays in updates, discrepancies may exist between the content displayed here and the current product status. We encourage you to reach out to our dedicated sales team to verify the most up-to-date details. It is important to understand that the information provided on this site does not constitute a formal offer or commitment, and our company reserves the right to periodically enhance and amend website information without prior notice. We appreciate your understanding in this regard.