Lab DC magnetron sputter coating machine with a 2-inch target source

Lab DC magnetron sputter coating machine is a compact magnetron sputtering system with one 2" target sources. DC source for coating metallic material. A film thickness tracker is included to enable the user to control processing easily. This coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE etc. Its compactness and ease of operation make it an ideal coating system for use in R&D labs. The Lab DC magnetron sputter coating machine is equipped with a set of technical parameters to ensure its efficient operation. It is designed to operate on a 220VAC power supply at 50/60Hz, single-phase, with a total power consumption of 2000W, which includes the pump. The power source is customizable, providing the option of one RF power source or a 500W DC source, specifically intended for coating metallic materials. The machine features a single 2" Magnetron Sputtering Head with water cooling jackets, allowing for the connection of an optional power source. Efficient cooling is achieved with a water flow rate of 10ml/min for the head. The vacuum chamber is constructed from high purity quartz, with dimensions measuring 300mm in diameter and 300mm in height, creating an ideal environment for sputtering processes. A sample holder, with a size of 185mm, is included and offers adjustable rotation speeds ranging from 1 to 20rpm. It provides precise temperature control, with a temperature range adjustable from room temperature (RT) to a maximum of 500℃, maintaining an accuracy of +/- 1.0℃. The vacuum pump station is a crucial component of the system, featuring a high-speed turbo vacuum pump system directly installed on the vacuum chamber, ensuring a maximum vacuum level. Additionally, a heavy-duty dual-stage mechanical pump is connected to the turbo pump, enhancing the overall pump speed. The machine includes a mobile pump station, allowing the compact sputtering coater to be placed on top of the station. The maximum vacuum level achievable is 10^-6 torr, and chamber baking is supported. For coating thickness monitoring, the machine is equipped with a precision quartz thickness sensor integrated into the chamber, providing accuracy down to 0.10 Å. An LED Display Unit located outside the chamber enables the input of coating material data, displays the total thickness coated, and indicates the coating speed. The system includes five quartz sensors (consumable) and requires water cooling. The Lab DC magnetron sputter coating machine comes with a one-year limited warranty and lifetime support, ensuring the reliability and longevity of the equipment. These detailed technical specifications collectively define the capabilities and features of the machine, offering valuable insights into its performance and functionality.