High vacuum RTP rapid annealing furnace
This product is a high vacuum RTP rapid annealing furnace, heated by the halogen lamp, and can be used for rapid thermal annealing, rapid thermal oxidation, rapid thermal nitriding, silicidation, diffusion, compound semiconductor annealing, annealing after ion implantation, electrode alloying, crystallization and Densification, alloy melting point analysis, film deposition, etc.
Product Description
The equipment, designed for high vacuum Rapid Thermal Processing (RTP) annealing, is a sophisticated system comprised of key components, including a quartz vacuum chamber, vacuum pump unit, water cooling unit, and a user-friendly control system. The control system features intelligent temperature control meter control and a touch screen operation interface, providing a digital parameter interface and an automatic operation mode. This configuration establishes an excellent research and development platform, offering users versatility and precision in their experiments. The furnace chamber adopts a left-right sliding mechanism, allowing flexible adjustment of the distance from the sample, enhancing convenience in experimental setups.
The O1000-200I-T-RTP high vacuum RTP rapid annealing furnace exhibits impressive specifications with an inner diameter of 100mm, a heating temperature zone extending 400mm, and a total length of 550mm, all constructed from high-purity quartz material. The furnace facilitates a versatile heating rate ranging from 0 to 200℃ per second, and its efficient cooling rate achieves temperatures above 200℃ in less than 25 minutes. Utilizing a halogen lamp as the heating element, the furnace is equipped with a KF16 vacuum interface and a pagoda head intake port with a 10mm outer diameter air hose for vacuum-related processes. The φ100 stainless steel vacuum method water cooling flange features a φ10mm quick plug connector for efficient water cooling.
The vacuum system relies on a bipolar rotary vane pump with a pumping speed of 1.1L/s, capable of reaching an ultimate vacuum of 10-1Pa. The temperature control system, driven by an intelligent temperature control meter, ensures precise temperature control and incorporates over-temperature protection. Temperature measurement is facilitated by a K-type thermocouple. To complement the system, a water chiller with a 9L water tank capacity and a maximum lift head of 10m is integrated. The intake port for the water chiller is a φ10 Pagoda Head, and it includes a manual air release valve.
Operating at 220V and 50Hz, consuming 24kW, the furnace is compact yet robust with overall dimensions of 1200mm x 500mm x 480mm. This makes it an ideal solution for high vacuum RTP rapid annealing applications, offering precise control and efficiency in a compact design.
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