High vacuum multi arc ion coating system for multiple amorphous alloys

MIOP500 is a high vacuum multi arc ion coating system that uses arc discharge to ionize conductive materials and uses its advantages of good diffraction to generate high-energy ions and deposit them on the substrate (especially porous substrates such as foamed nickel) to prepare nano-scale thin films Coating or nanoparticles. It is mainly composed of coating chamber, multi-arc target, multi-arc power supply, pulse bias power supply, sample stage, heating, vacuum system, gas circuit system, PLC and touch screen semi-automatic control system, etc.; the equipment host and control integrated design, easy to operate; The structure is compact and the floor space is small. This series of equipment is widely used in teaching, scientific research experiments in universities and scientific research institutes, as well as preliminary exploratory experiments and development of new products in production enterprises, and are well received by users. multi arc ion coating main purpose: Preparation of multiple amorphous alloys.Preparation of metal compounds, such as oxide and nitride films (oxygen or nitrogen atmosphere).Preparation of nano-particle catalyst membrane.The thermoelectric material target is used to prepare the thermoelectric effect film. The multi-arc ion coating equipment boasts several essential technical parameters. The vacuum chamber, constructed from high-quality 304 stainless steel, measures Ф500×H420mm and features a front door structure. The chamber's heating capability extends from room temperature to a precise 350±1℃. The vacuum system combines a composite molecular pump with a direct-coupled rotary vane pump and a high vacuum valve, further enhanced by a digital display composite vacuum gauge. It achieves a remarkable vacuum limit of better than 6.0×10-5Pa after baking and degassing, with a minimal leak rate of ≤0.8Pa/h during equipment boosting. Even after a 12-hour pump stoppage, the vacuum remains at or below 10Pa. The pumping speed allows for rapid evacuation from atmospheric pressure to 5.0×10-3Pa in under 15 minutes. The substrate table, with a size of Φ150mm and three rotation stations, can rotate between 0 to 20 rpm. The system incorporates two sets of DN100 new magnetic filter multi-arc targets for sputtering, accompanied by a -1000V pulse bias power supply. The control method employs a PLC and touch screen man-machine interface for semi-automatic control, featuring an alarm and protection system that safeguards against water shortage, over-current, over-voltage, open circuits, and other abnormalities in pumps and electrodes. The equipment's dimensions are L1900×W800×H1900(mm) for the host unit.