High Power Desktop Magnetron Plasma Sputtering Coater with 3 Rotary Target

Product Description The instrument is a three-target magnetron coating machine with three two-inch magnetron target heads. The tilt angle of the target head and the distance from the sample stage are adjustable. In order to facilitate the experimental operation, the coating machine is also equipped with an electric baffle, which can directly control the opening and closing of the baffle through the display screen.

The coating machine is equipped with a 100W RF power supply. By manually switching the output lines, three target heads can share one power supply (not simultaneous), thereby enabling operation of plating multiple or multiple layers of membranes in a single experiment. The device is compact and well designed and can be placed on the desktop, making it ideal for lab purchases. This set of configuration does not contain a vacuum system, customers can choose the high vacuum system that meets the requirements according to your own needs. The product in question is a Three-target RF magnetron sputtering coating machine with the model name VTC-3RF. It operates on an AC220V, 50Hz supply voltage and offers a continuously adjustable RF power supply ranging from 0 to 100W, with a maximum power capacity of 200W.

The chamber of this coating machine is constructed from stainless steel, featuring a size of O.D.φ300mm x 300mm. The system is equipped with three 2" magnetron sputtering heads, each of which has adjustable tilt angles from 0 to 25° and a variable distance from the target to the sample stage ranging from 50 to 80mm. Additionally, each target head comes with an electric baffle. To maintain optimal operating temperatures, the magnetron sputtering heads are water-cooled and require a 10L/min water chiller for cooling.

The sample stage parameters include a size of φ185mm, adjustable rotation speeds from 1 to 10rpm for sample uniformity, and the capability to heat samples up to 500°C. Temperature control accuracy is maintained at ±1°C, ensuring precise and controlled sample processing within the chamber.


Disclaimer: The information presented on this website, including product images, product descriptions, and technical parameters, serves as a reference guide. Please note that due to potential delays in updates, discrepancies may exist between the content displayed here and the current product status. We encourage you to reach out to our dedicated sales team to verify the most up-to-date details. It is important to understand that the information provided on this site does not constitute a formal offer or commitment, and our company reserves the right to periodically enhance and amend website information without prior notice. We appreciate your understanding in this regard.