High Power DC Magnetron Sputtering Coater
High power DC magnetron sputtering coater is a high power desktop magnetron plasma sputtering coater with a water cooling 2" target head, water chiller and rotatable sample holder. The coating unit is designed for coating all metallic films up to 4" diameter wafer including Zn, Al, Ti and carbon light film at an affordable cost. One Al target is included for immediate use.
Product Description
Introducing our High Power DC Magnetron Sputtering Coater, a state-of-the-art system meticulously crafted for precision coating applications. This coater, equipped with a PLC control panel, offers convenient and intuitive operation, ensuring a seamless user experience. Its compact design and cost-effectiveness make it an ideal choice for creating various metal films, catering to diverse coating needs.
Operating on a 220VAC power supply at 50/60Hz, with the option for 110V power using a 1000W transformer (15A fuse), this coater delivers impressive performance. It boasts an output power of 1600VDC, with a maximum power output of 250W and an overcurrent protection feature set at greater than 150mA.
The specimen chamber, constructed from a quartz glass tube, stands at 165mm in outer diameter, 150mm in inner diameter, and 250mm in height. A 2'' flexible magnetron sputtering head with a water cooling jacket ensures efficient and controlled sputtering. The 50mm diameter stainless steel sample stage, equipped with a rotatable feature (adjustable rotation speed from 0 to 5 RPM), guarantees uniform coating. A manually operated shutter safeguards the target during the coating process.
Flexibility is a key feature, with an adjustable distance between the sputtering head and the sample stage within the range of 60mm to 100mm. This coater achieves a maximum coating area of 4" in diameter, providing versatility for various applications.
To maintain optimal sputtering head temperature, an Air Cold Recirculating Water Chiller with a flow rate of 10 L/min is included. The user-friendly 6'' color touch-screen interface on the control panel, integrated with PLC, allows comprehensive monitoring and control of parameters such as vacuum and current, streamlining the coating process.
The system features a built-in KF25 vacuum port and requires an Ar gas tank with a pressure regulator (not included). Achieving an ultimate vacuum pressure of <1.0E-2 Torr with a Vane vacuum pump (not included) for targets like Au, Ag, Pt, Cu, Mo, this coater is versatile. For targets sensitive to air, such as Al, Mg, Li, Lr, Ti, Zn, a Turbomolecular pump (not included) can reach a vacuum level of <1.0E-5 Torr. The lowest vacuum level may reach <4.0E-6 Torr by pumping overnight and baking.
Gas atmosphere control is facilitated by a needle valve allowing Ar gas inlet for improved plasma coating. However, an Ar gas tank with a pressure regulator (not included) is required. The coater includes one 2" copper target for testing and can be used to coat various metallic materials, offering versatility in applications. It comes with a one-year limited warranty and lifetime support, measuring L 440mm x W 330mm x H 290mm and weighing 20kg. Elevate your coating capabilities with the High Power DC Magnetron Sputtering Coater.
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