Halogen lamp RTP vertical rapid annealing furnace
Halogen lamp RTP vertical rapid annealing furnace is a fast 8-inch piece of rapid annealing furnace, adopting innovative heating technology, which can realize the real substrate temperature measurement, and it does not need to adopt the traditional rapid annealing furnace temperature compensation, and it has temperature control precision, high temperature repeatability. Customers include many leading semiconductor companies and international scientific research team, which are ideal choices for the annealing process of semiconductor process.
Product Description
The RTP vertical rapid annealing furnace is engineered to accommodate 8-inch substrates and boasts a substrate base that can be either a quartz needle or a Si-C coated graphite base, providing flexibility in material choices for diverse annealing processes. Operating within a broad temperature range from 150 to 1250℃, this furnace offers exceptional versatility, making it suitable for a wide array of annealing applications. Notably, it is renowned for its impressive heating speed, ranging from 10 to 150℃ per second, ensuring efficient and rapid annealing.
Temperature uniformity is a standout feature, with a variation of ≤±1.5% (measured at 800℃ for silicon wafers) and ≤±1.0% (measured at 800℃ for substrates on Si-C coated graphite susceptors). Precision in temperature control is a paramount consideration, and this furnace achieves high accuracy, maintaining temperatures within ±3℃. The temperature repeatability is also remarkable, standing at ≤±3℃, contributing to consistent and reliable annealing results. The furnace excels in vacuum performance, operating under vacuum conditions with a degree of 5.0E-3 Torr or 5.0E-6 Torr, catering to specific requirements.
Pneumatic supply is streamlined through a standard 1-channel N2 purge and cooling air circuit, intelligently controlled by MFC (maximum 3 channels). Recognizing the potential duration of annealing processes, this furnace offers an annealing duration of ≥35 minutes at 1250℃, ensuring comprehensive and effective processing. Temperature control is efficiently managed through fast digital PID control, optimizing the annealing outcomes.
Despite its remarkable capabilities, the furnace maintains a compact design, measuring 900mm in length, 650mm in width, and 1600mm in height. This compact footprint enhances its suitability for various laboratory and industrial applications, providing a powerful and versatile solution for precise and efficient rapid thermal annealing.
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