Halogen lamp RTP annealing furnace
The halogen lamp RTP annealing furnace is a 6-inch wafer rapid annealing furnace that employs innovative heating technology for real substrate temperature measurement, eliminating the need for traditional temperature compensation methods. This results in accurate and highly repeatable temperature control. The furnace is widely adopted by international semiconductor companies and renowned scientific research teams, making it an ideal choice for semiconductor annealing processes.
Product Description
In terms of technical features, the high-temperature rapid thermal processing (RTP) system utilizes infrared halogen tube lamp heating technology to ensure precise substrate temperature control. Unlike traditional annealing furnaces that use thermocouples at a distance from the substrate, the halogen lamp RTP annealing furnace employs a dedicated flake-like Real T/C KIT for temperature measurement. This kit, located very close to the sample, allows for real temperature measurement without the need for compensation, as it quickly reaches thermal equilibrium with the substrate.
The system includes fast digital PID temperature control for enhanced accuracy and uniformity, along with a stainless steel cold wall vacuum chamber for excellent stability. Its compact design makes it suitable for desktop use, and it is PC-controlled with a user-friendly touch screen interface for easy operation.
The system is versatile, operating in both normal pressure and vacuum environments, with a standard vacuum degree of 5×10-3 Torr and the ability to achieve a low vacuum level of 5×10-6 Torr with a two-stage molecular pump. Additionally, it supports up to three gas channels with precise mass flow controller (MFC) control, ensuring no cross-contamination or metal contamination. These features make the system ideal for a variety of research and industrial applications that require high-temperature processing in a controlled environment.
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