Gold, Platinum, Indium and Silver Plasma Sputtering Coater
This is a compact plasma sputtering coater designed for making metallic coatings, such as gold, platinum, Indium and silver etc. which can be applied on a sample up to 50 mm diameter with 300 Angstrom thickness.
Product Description
Introducing the Gold, Platinum, Indium, and Silver Plasma Sputtering Coater, designated as model GSL1100X-SPC16. This specialized coater is designed for vacuum coating applications and comes with CE certification, ensuring its quality and reliability. It is proudly offered by , a trusted name in the industry. This Plasma Sputtering Coater is engineered for precision, making it an ideal choice for sputtering various substrates, including Gold, Silver, Indium, and more. It is a brand-new device, ready to deliver exceptional performance. To ensure its safe transport and protection, it is packaged in a sturdy wooden case. The Gold, Platinum, Indium, and Silver Plasma Sputtering Coater, model GSL1100X-SPC16, offers a range of essential features and technical specifications for precise sputtering applications. It comes equipped with instruments to monitor and indicate the chamber's condition, including a sample sputtering chamber vacuum gauge and sputtering ampere meter. The coater provides control over the sputtering process with an adjustable sputtering current controller and a micro vacuum gas valve. Integrated with an internal automatic control circuit, these components enable easy regulation of vacuum chamber pressure, ionization current, and the selection of ionized gas for achieving optimal coating results. To ensure long-term durability and prevent issues like the "broken edge" phenomenon that can affect vacuum levels in the sample sputtering chamber, the coater incorporates a specially designed bell edge rubber seal ring. In comparison to rubber seals, a ceramic seal high-pressure head is used, offering increased resilience. The coater's design takes into account the ionization characteristics of gases in an electric field. It features a high-capacity sample sputtering chamber and corresponding area sputtering target, promoting uniformity and purity in the coating film. Technical parameters include a target (upper electrode) with a diameter of 45mm and a thickness of 0.12mm, a vacuum specimen chamber with a diameter of 160mm and a height of 120mm, and a sputtering area of Ф50mm with adjustable height. The coater achieves a maximum vacuum degree of ≤4X10-2 mbar, with a maximum plasma current of 50mA. It offers a timer function with a maximum duration of 900 seconds and is equipped with a compact vacuum valve that can be connected to a φ3mm flexible tube. It is compatible with various gases and can handle a maximum voltage of -1600(-3000)DCV. Mechanical pumping is facilitated at a rate of 2L/S. Optional accessories for this coater encompass a wide range of target materials, further enhancing its versatility and applicability to various sputtering applications.