Electron beam evaporation coating equipment with auxiliary ion source
The electron beam evaporation coating equipment is mainly used to prepare various conductive films, semiconductor films, ferroelectric films, optical films, micro-nano device micro-processing, electron microscope sample pretreatment, etc. It is especially suitable for vapor deposition of various refractory metal materials. It can be used not only for hard substrates such as glass and silicon wafers, but also for coating on flexible substrates such as PDMS, PTFE, and PI.
Product Description
The operational characteristics of the system provide crucial insights into its functionality. The system is designed to operate within an ambient temperature range of 5℃ to 40℃, ensuring optimal performance in diverse environmental conditions. It requires a power supply of 380V with a maximum power consumption not exceeding 20KW. The water pressure for the system should be maintained below 2.5bar to ensure proper functionality.
The vacuum chamber is a key component, consisting of an evaporation chamber sized at φ500×H500(mm) and a transition warehouse of φ280×H300(mm). The system incorporates advanced features such as a new electron gun with six-hole crucibles and a Kaufman ion source K08. The sample turntable accommodates samples up to ≤φ150mm, facilitating sample rotation and allowing users to adjust the distance between the sample and the electron gun based on specific requirements. The maximum heating temperature for the sample is ≤500℃.
Noteworthy is the system's impressive vacuum performance, achieving an ultimate vacuum of ≤5x10-5Pa after 12-24 hours of baking and maintaining a pumping rate of ≤5x10-4Pa within just 40 minutes from atmospheric pressure. The system ensures meticulous control over the leakage rate, with the entire machine boasting a leakage rate of less than or equal to 1×10-8Pa.L/s. Even after stopping the pump for 12 hours, the vacuum chamber's vacuum degree should remain less than or equal to 10Pa.
To guarantee precise coating, the system employs a TM160 film thickness meter for real-time monitoring of the coating process and thickness. The system is engineered to uphold coating thickness evenness at ≤3%, ensuring consistent and accurate results across various applications. This comprehensive set of technical parameters positions the system as a reliable and precise tool for coating applications in diverse industrial and research settings.
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