Dual-target magnetron sputtering coater (with RF&DC power supply) MSP300S-RFDC
Dual head magnetron sputtering coater equipment is a special laboratory coating instrument developed by our company. The magnetron sputtering coater equipment can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
Product Description
In comparison to conventional plasma sputtering methods, the dual-target magnetron sputtering coater excels with its advantages of high energy, rapid deposition rates, and minimal sample temperature elevation. A key feature is the water-cooled interlayer accompanying the magnetron target, efficiently dissipating heat and preventing surface accumulation. This design, combining compactness with performance equilibrium, not only enhances aesthetic appeal but also ensures comprehensive functionality. The equipment, navigated through a user-friendly touch screen and a built-in one-button coating program, emerges as an ideal laboratory tool for thin film preparation.
Delving into specific technical parameters, the coater operates on an AC220V, 50Hz power supply, harnessing a total power of 6KW to achieve an ultimate vacuum level of 5x10-4Pa. The sample table, with a diameter of φ150mm, facilitates precise temperature control at ±1℃ and accommodates a maximum heating temperature of 500℃. Offering flexibility for diverse coating needs, the table supports adjustable rotation speeds ranging from 1 to 20rpm. The coater features two 2-inch magnetron sputtering heads utilizing a water-cooled cooling mode with a requisite 10L/min flow rate. An integrated water chiller ensures efficient heat dissipation, contributing to stable sputtering performance.
Constructed from high-quality SUS material, the vacuum chamber boasts dimensions of φ300mm x 340mm in height. Its open-type design, coupled with a φ100mm watch window, simplifies target replacement. Gas flow control is facilitated by a one-channel system with a 200sccm capacity for argon (Ar) gas. The vacuum pump system, employing a molecular pump, achieves a pumping speed of 600L/S, maintaining optimal vacuum conditions. The coater incorporates a quartz vibrating film thickness gauge, offering precise measurements at a resolution of 0.10 angstrom.
Powering the sputtering process, the coater features a 500W DC power supply for metal film preparation and an additional 500W RF power supply tailored for non-metallic films. An all-in-one computer interface streamlines operation, providing a user-friendly platform for control and monitoring. With dimensions of 1090mm x 900mm x 1250mm and a weight of 350kg, this coater ensures stability, making it seamlessly adaptable to diverse laboratory and industrial environments.
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