Dual-target magnetron sputtering coater
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Product Description
The Dual-target magnetron sputtering coater stands as a cutting-edge solution for advanced sputtering applications, embodying precision and efficiency. This meticulously engineered instrument, independently developed by our company, offers a cost-effective and customizable solution for diverse coating needs. With standardized and modular design principles, users can choose between 1-inch or 2-inch magnetron targets based on substrate size, ensuring tailored and flexible coating options.
Equipped with two 500W DC power supplies, specifically designed for metal film preparation, this coater is well-suited for multi-layer or multiple coating requirements. The inclusion of a two-channel high-precision mass flowmeter enhances gas flow control, and for more intricate setups, customization options for up to a four-channel mass flowmeter are available to meet complex gas environment construction requirements.
The coater integrates advanced turbomolecular pump sets, achieving an ultimate vacuum level of up to 1.0E-5Pa. The molecular pump gas path, controlled by multiple solenoid valves, allows users to open the chamber for sample retrieval without shutting down the pump, significantly improving work efficiency. For added convenience and control, the coater can be equipped with an integrated industrial computer, enabling seamless management of functions such as vacuum pump control and sputtering power control.
This precision instrument boasts a φ300mm×300mm stainless steel vacuum chamber with a φ100mm watch window for real-time monitoring. The inclusion of two water-cooled interlayer-equipped magnetron sputtering heads ensures efficient target material cooling, providing stability for prolonged operations. The sample stage accommodates substrates up to 4 inches in diameter, with adjustable rotational speeds from 1 to 20 rpm and a maximum heating temperature of 500℃, maintaining precise temperature control within +/- 1.0 °C.
Efficient gas flow control is achieved through two installed mass flow meters with a range of 0-200sccm. The coater's molecular pump system, operating at a pumping speed of 80L/S, ensures optimal vacuum processing with one-button operation. The cooling system, operating at a rate of 16L/min, contributes to consistent temperature control. Operating seamlessly on a voltage of 220V and a frequency of 50Hz, the Dual-target magnetron sputtering coater emerges as a state-of-the-art solution for researchers seeking precision and efficiency in their sputtering applications.
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