Dual sputter sources plasma sputtering coater with rotary sample stage PSP180G-2TA-RS
This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage.
Product Description
This small plasma sputtering coater, characterized by its user-friendly PLC control system and touch screen operation, stands out as an accessible and efficient solution for laboratory coating experiments. Its compact size and visually appealing design make it a top choice for various thin-film deposition processes.
Equipped with a range of technical specifications, this coater offers versatility in thin-film applications. The sample stage, with a size of 100mm, provides flexibility with adjustable rotating speeds ranging from 1 to 20rpm. Two 2-inch plasma sputtering sources, employing natural cooling methods, contribute to optimal operational temperatures. The vacuum chamber, constructed from high-purity quartz material, features dimensions of φ180mm x 210mm and ensures omnidirectional visibility through an observation window. The design incorporates a removable top cover, with both upper and lower covers made from durable 304 stainless steel. The chamber interfaces with a KF16 pumping port and a 1/4 inch ferrule connector for gas intake.
Power configurations include a single DC power supply with a maximum output power of 150W, supporting a sputtering power of 1200V and a maximum sputtering current of 50mA. The vacuum system utilizes a dual-stage rotary vane vacuum pump with KF16 pumping ports and exhaust interfaces, achieving a pumping rate of 1.1L/s (4m3/h) and maintaining an ultimate vacuum level of ≥0.1Pa, monitored through a resistance vacuum gauge. Operating on an AC 220V 50Hz power supply, the coater consumes a total power of 1.5kW. Its compact design, measuring 500mm x 320mm x 470mm and weighing 30kg, positions it as an ideal tool for a wide range of research and industrial thin-film deposition applications. These detailed technical specifications define the coater's capabilities, ensuring precise and efficient coating processes.
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