Double-head magnetron sputtering coater with bias power supply

Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. this magnetron sputtering coater can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc. Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high coating rate and low sample temperature rise, which is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled inter layer, the water cooler can effectively take away heat, avoid heat gathering on the target surface, and make the magnetron coating work stably for a long time. In addition, the device is also equipped with bias power supply, which can add bias electric field between the target and the sample platform, enhance the energy of ions, improve the film quality and adhesion of the film. The whole machine adopts touch screen control, one key coating procedure, simple operation, and is an ideal equipment for preparing thin film in the laboratory. The Double target magnetron sputtering coater is characterized by its comprehensive technical parameters, ensuring efficient and precise operation. It operates on AC220V at 50Hz with a power consumption of 3KW, and it is capable of achieving an ultimate vacuum of 10-6 torr, providing an ideal environment for sputtering processes. The sample stage is designed with a diameter of 150mm and offers impressive heating capabilities, with a maximum temperature of 500℃. It maintains a high level of accuracy, within ±1℃, and provides adjustable rotation speeds ranging from 1 to 20rpm. The coater is equipped with two 2-inch magnetron sputtering heads, employing an efficient water cooling system with a flow rate of 10L/min. The vacuum chamber, constructed from stainless steel and measuring a diameter of 300mm and a height of 300mm, ensures a pristine sputtering environment. An observation window with a diameter of 100mm allows for easy monitoring, and the open-top design facilitates convenient target replacement. Gas flow is controlled through a two-channel system, accommodating Ar and N2 gases within a range of 0-100sccm. The vacuum pump system relies on a molecular pump with a pumping speed of 600L/S to ensure efficient evacuation. Film thickness measurements are conducted using a quartz vibrating film thickness gauge with an impressive resolution of 0.10 μM. The sputtering power supply consists of one DC power supply with a capacity of 1000W, suitable for preparing metal films, and one 500W RF power supply, suitable for non-metallic coating applications. The coater can be operated via panel button controls, providing ease of use and efficient control. In terms of dimensions, it measures 1400mm × 750mm × 1300mm and has a weight of 300 KG. These detailed technical specifications collectively define the capabilities and dimensions of the Double target magnetron sputtering coater, offering valuable insight into its features and performance.