Desktop single target magnetron sputtering coater with reciprocating sample table
Desktop single target magnetron sputtering coater is a high cost performance magnetron sputtering coater equipment independently developed by our company, which has the characteristics of miniaturization and standardization.
Product Description
The magnetron target can be selected from 1 inch and 2 inches, and customers can choose according to the size of the substrate to be plated; the power supply is 150W DC power supply, which can be used for metal sputtering coating. The coating instrument is equipped with a vent interface, which can be filled with protective gas. If the customer needs to mix gas, you can contact the staff to configure a high-precision mass flow meter to meet the needs of the experiment. The instrument is equipped with advanced turbo molecular pump set, the ultimate vacuum can reach 1.0E-5Pa, and other types of molecular pumps are also available for purchase. Desktop single target magnetron sputtering coater application range: The equipment can be used to prepare single-layer ferroelectric films, conductive films, alloy films, etc. Compared with similar equipment, this single-target magnetron sputtering coating instrument is compact in design, highly integrated, compact, and can be placed on a table for use. It is an ideal equipment for preparing material films in the laboratory. The single target magnetron sputtering coater is characterized by a comprehensive set of technical parameters. It features a reciprocating sample table with dimensions of 50*100mm, offering precise control with a reciprocating speed ranging from 0 to 50mm/s. The magnetron target gun is equipped with a circular flat target head plane and operates within a sputtering vacuum range of 10Pa to 0.2Pa. The target has a diameter of 2 inches and is recommended to have a thickness between 2mm and 5mm. The target head temperature is kept below 65℃ to ensure efficient operation. The vacuum chamber, measuring about Φ180mm in diameter and H 215mm in height, is constructed from high purity quartz. It incorporates an omnidirectional transparent observation window and features a removable top cover for easy access. Power is supplied through a DC power supply with a maximum output of 150W. The system includes one DC power supply unit. The molecular pump system includes a backing pump, specifically a rotary vane pump (VRD-4), with a pumping speed of 1.1L/s and an ultimate vacuum capability of 510-1Pa. The molecular pump has a molecular pumping speed of 600L/S, a rated speed of 24000rpm, and an ultimate vacuum capability of 510-5Pa. It maintains a vibration value of less than or equal to 0.1um, with a start time of less than or equal to 4.5 minutes and downtime under 7 minutes. The cooling system employs both water cooling and air cooling, with a water chiller ensuring that the cooling water temperature remains at or below 37℃ and a flow rate of 10L/min. The power supply operates at AC220V and 50Hz, meeting the supply voltage requirements for the coater. These detailed technical specifications collectively define the capabilities and dimensions of the single target magnetron sputtering coater, providing insight into its features and performance.