Desktop single-target magnetron sputtering coater for SEM sample

Introducing the MSP180G-1T-A, a desktop single-target magnetron sputtering coater designed for diverse applications, including the preparation of metal films, usage in electronic and optical fields, specialized ceramic preparation, and SEM sample preparation in laboratories. This equipment, housed in a quartz vacuum chamber, ensures an Omni-visible coating process for easy experiment observation and recording. The chamber's design allows for convenient opening and cleaning, catering to laboratory requirements. Adding to its functionality, the coater is equipped with a rotating heating sample table, enhancing film uniformity and quality, all within a modular design that emphasizes simplicity and intuitive operation.
 

For optimal utilization, the coater operates within an environment featuring a temperature range of 25℃±15℃ and a humidity level of 55%Rh±10%Rh. It relies on an AC220V, 50Hz power supply, ensuring proper grounding, and boasts a rated power of 1000W. Argon gas, with a purity equal to or exceeding 99.99%, is essential to fill the equipment chamber for cleaning. The coater's table dimensions should be 600mm×600mm×700mm, with a bearing capacity exceeding 50kg, necessitating proper ventilation and cooling.
 

In terms of technical specifications, the coater employs a 300W DC power supply, delivering a maximum output voltage of 600V and a limited current output of 500mA. The 2-inch balanced target with a magnetic coupling baffle accommodates target materials measuring φ50mm x 3mm in thickness. The cavity, constructed from high-purity quartz, has dimensions of φ180mm x 200mm. The rotating heating sample table offers continuous adjustment of rotation speed and can reach a maximum heating temperature of 500℃, with recommended heating rates ranging from 10℃/min to 20℃/min. Cooling is facilitated through a circulating water cooler for the magnetic target and molecular pump, with a tank volume of 9L and a flow rate of 10L/min.
 

The gas supply system relies on a mass flow meter, featuring argon gas with a flow range of 1~30sccm (customizable) and an accuracy of ±1.5%. The vacuum chamber features a KF25 air pumping interface and a 1/4 inch double ferrule joint for air intake. Operated via a 7-inch color touch screen, the coater allows adjustable sputtering current settings, incorporating safety mechanisms to automatically disconnect the sputtering current in cases of overcurrent or excessively low vacuum. The coater achieves an ultimate vacuum of 5E-4Pa when paired with a matching molecular pump, utilizing a Parana vacuum gauge for measurement in the range of 1 to 105Pa.
 

Magnetron sputtering operates in a high vacuum environment, typically within 2Pa, necessitating the use of a molecular pump. Maintenance of a high-oxygen-free environment involves cleaning the vacuum chamber with high-purity inert gas at least three times. Due to its sensitivity to air intake, a mass flow meter is crucial for controlling air intake during magnetron sputtering.
 

Optional accessories include a film thickness monitor with high resolution and accuracy, dependent on process conditions. Additional accessories encompass high-performance molecular pump sets, small molecular pump sets, vacuum bellows, and a film thickness meter crystal oscillator, catering to various functionalities. A stainless steel fine-tuning valve is also available for low coating requirements.

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