Desktop single-target magnetron coater with RF power supply
Desktop single-target magnetron coater with RF power supply is a desktop single-target magnetron sputtering coater，it can be used in the preparation of metal film,and also used in electronic fields,optical fields,special field of ceramic preparation,it surely can be used in SEM sample preparation in laboratory。This model is equipped with RF power supply, especially suitable for coating of non-metallic or other non-conductive materials.
Product Description
Presenting the MSP190S-1T-RF, a Desktop Single-Target Magnetron Coater with RF power supply, meticulously designed for laboratory applications. The equipment boasts a high vacuum stainless steel cavity, featuring a quartz observation window baffle for seamless experiment observation and recording. Its compact design, coupled with excellent vacuum performance, makes it an optimal choice for laboratory use. The inclusion of a rotating heating sample table enhances film uniformity and quality, while the modular design ensures a user-friendly experience with a straightforward operation logic and an intuitive interface.
Operational specifications mandate an environment with a temperature range of 25℃ ± 15℃ and humidity levels at 55%Rh ± 10%Rh. Powered by AC220V at 50Hz, the equipment draws a rated power of 1500W. Maintaining optimal conditions requires filling the equipment chamber with argon gas (≥99.99%). The coater is positioned on a table measuring 600mm × 600mm × 700mm, with a minimum bearing capacity of 80kg, necessitating proper ventilation and cooling.
Technically, the coater features a 300W DC power supply, delivering a maximum output voltage of 600V and a limited current output of 500mA. Its 2-inch balanced magnetron target, equipped with a magnetic coupling baffle, accommodates φ50mm x 3mm thick target material. The cavity, constructed from robust 304 stainless steel, has dimensions of an outer diameter of 194mm, an inner diameter of 186mm, and a height of 230mm.
The coater's sample table offers rotational flexibility with speeds ranging from 1 to 20rpm and achieves a maximum heating temperature of 500℃. Cooling for the magnetic target and molecular pump is efficiently handled by a circulating water cooler, featuring a 9L tank volume and a flow rate of 10L/min. The gas supply system integrates a mass flow meter for precise control of Argon gas flow, adjustable from 1 to 30sccm.
Safety measures include adjustable sputtering current settings and automatic cut-off mechanisms for overcurrent and low vacuum conditions. The system's ultimate vacuum capability is 5E-4Pa, with vacuum measurements facilitated by a Parana vacuum gauge in the range of 1~105Pa. To ensure optimal performance, the vacuum chamber should undergo cleaning with high-purity inert gas at least three times, and the use of a mass flow meter is essential for managing air intake.
Optional accessories elevate the coater's functionality, including a Film Thickness Monitor and additional equipment like high-performance molecular pump sets, small molecular pump sets, vacuum bellows, and a film thickness meter crystal oscillator, providing a comprehensive solution for varied scientific and industrial needs.
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