Desktop single-target magnetron coater with bias voltage
This equipment is a single-target magnetron sputtering coater instrument, which can be used for the preparation of general metal thin films. At the same time, the equipment is equipped with a bias power supply, which can be used for plasma cleaning before sputtering and exerting bias during sputtering.
Product Description
Introducing the MSP180G-1T-B (Bias Voltage) Desktop Single-Target Magnetron Coater, a powerhouse of precision designed to thrive in laboratory environments. Crafted with a high vacuum stainless steel cavity featuring a quartz observation window baffle, this coater simplifies experiment observation and recording. Its compact design, coupled with outstanding vacuum performance, makes it an ideal choice for laboratory applications.
This coater is equipped with a rotating heating sample table, elevating film uniformity and quality. Its modular design incorporates a simple operational logic and an intuitive interface, ensuring ease of use for both beginners and seasoned researchers alike.
In terms of technical specifications, this coater operates optimally within a temperature range of 25℃±15℃ and humidity at 55%Rh±10%Rh. Powered by an AC220V, 50Hz supply, with a rated power of 1000W, it demands high-purity argon gas (≥99.99%) for efficient use. The equipment chamber's dimensions, emphasizing a table size of 600mm×600mm×850mm and robust bearing capacity of ≥50kg, underline the need for adequate ventilation and cooling in its installation location.
Delving into its technical prowess, the coater features a 300W DC power supply, delivering a maximum output voltage of 600V with a limited current output of 500mA. The 2-inch balanced magnetron target, equipped with a magnetic coupling baffle, accommodates φ50mm x 3mm thick target materials. The cavity, constructed from premium 304 stainless steel, stands at an outside diameter of 194mm, an inside diameter of 186mm, and a height of 230mm.
The rotating heating sample table allows for continuous adjustment in rotation speed from 1 to 20rpm, with a maximum heating temperature of 500℃ and recommended heating rates between 10℃/min and 20℃/min. Efficient cooling is facilitated by a circulating water cooler for the magnetic target and molecular pump, featuring a 9L tank volume and a flow rate of 10L/min.
The gas supply system employs a mass flow meter for Argon gas, offering a customizable flow rate of 1~30sccm with an accuracy of ±1.5% within the specified range. Interfaces include a KF25 air pumping interface and a 1/4 inch double ferrule joint for air intake. User interaction is enhanced by a 7-inch color touch screen.
Safety measures include adjustable sputtering current, automatic cutoff in case of overcurrent or excessively low vacuum, and an ultimate vacuum capability of 5E-4Pa (with a matching molecular pump). Vacuum measurement utilizes a Parana vacuum gauge with a range spanning 1～105Pa.
Precautions highlight the necessity of a molecular pump for maintaining high working vacuum and recommendations for cleaning the vacuum chamber with high-purity inert gas at least three times to establish an oxygen-free environment. Given magnetron sputtering's sensitivity to air intake, precise control is facilitated by a mass flow meter.
Optional accessories, including a Film Thickness Monitor renowned for exceptional resolution and accuracy, along with various add-ons like high-performance molecular pump sets, vacuum bellows, and crystal oscillators for film thickness measurement, round out this comprehensive equipment package, catering to diverse scientific and industrial needs with precision and efficiency.
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