Desktop bottom-target magnetron sputtering coater for SEM sample
Desktop bottom-target magnetron sputtering coater is a desktop single-target magnetron sputtering coater,it can be used in the preparation of metal film,and also used in electronic fields,optical fields,special field of ceramic preparation,it surely can be used in SEM sample preparation in laboratory.
Product Description
Introducing the MSP190S-1T-UD, a cutting-edge Desktop Bottom-Single-Target Sputtering Coater featuring a high-vacuum stainless steel cavity with a quartz observation window baffle, facilitating easy experiment observation and recording. The cavity's compact design, combined with outstanding vacuum performance, makes it an ideal choice for laboratory applications. This equipment, employing a bottom-target design, mitigates issues related to film fragment fallout caused by prolonged coating of shielding covers, ensuring enhanced sample protection. The addition of a rotating heating sample table further improves film uniformity and quality.
Designed with a user-friendly modular approach, the MSP190S-1T-UD boasts intuitive operation logic and a straightforward interface, making it accessible for users of varying expertise. Operating optimally in an environment with a temperature range of 25℃±15℃ and a humidity level of 55%Rh±10%Rh, this coater requires an AC220V, 50Hz power supply and utilizes a rated power of 1000W. To maintain efficiency, it necessitates the use of high-purity argon gas (≥99.99%) provided by the user.
Technical specifications include a 300W DC power supply with a maximum output voltage of 600V and a limited current output of 500mA. The coater is equipped with a 2-inch balanced magnetron target featuring a magnetic coupling baffle, accommodating target materials with dimensions of φ50mm x 3mm thickness. The cavity, constructed from high-quality 304 stainless steel, measures 194mm in outside diameter, 186mm in inside diameter, and 230mm in height.
A rotating heating sample table offers flexibility with adjustable rotation speeds from 1 to 20rpm, a maximum heating temperature of 500°C, and recommended heating rates between 10℃/min and 20℃/min. Efficient cooling is facilitated by a circulating water cooler for the magnetic target and molecular pump.
Safety features include adjustable sputtering current, automatic cutoff for overcurrent or excessively low vacuum situations, and an ultimate vacuum capability of 5E-4Pa (with a matching molecular pump). Vacuum measurement is conducted using a Parana vacuum gauge with a range of 1～105Pa.
Precautions include the necessity of a molecular pump for achieving the high working vacuum required for magnetron sputtering. The recommendation involves cleaning the vacuum chamber with high-purity inert gas at least three times to establish a high-oxygen-free environment. Given the sensitivity of magnetron sputtering to air intake, a mass flow meter is recommended for precise control.
Optional accessories, such as a Film Thickness Monitor with exceptional resolution and accuracy, further enhance the versatility of this coater. It is a comprehensive solution tailored to meet the demands of diverse scientific and industrial applications with precision and efficiency.
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