Desktop 3 heads plasma sputtering coater with rotary heating sample stage PSP180G-3TA-RSH
This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage.
Product Description
This compact plasma sputtering coater, distinguished by its PLC control system and intuitive touch screen operation, stands out as an easily navigable solution for laboratory coating experiments. The addition of a rotatable heating sample stage enhances coating uniformity and film adhesion, contributing to its appeal as an efficient tool for thin-film deposition applications. Its small size and aesthetically pleasing design further solidify its position as the optimal choice for laboratory coating experiments.
The desktop 3 heads plasma sputtering coater, identified as PSP180G-3TA-RSH, is tailored for thin-film deposition with a set of technical specifications. The 100mm sample stage supports adjustable rotating speeds ranging from 1 to 20rpm. The coater features a heating system capable of reaching temperatures up to ≤500℃, ensuring precise temperature control with an accuracy of ±1℃ through PID temperature control. Equipped with three 2-inch plasma sputtering sources, the coater utilizes water cooling for temperature management. The vacuum chamber, constructed from high-purity quartz material and sized at φ180mm x 210mm, ensures omnidirectional visibility through an observation window. Its design includes a removable top cover, and both upper and lower covers are crafted from durable 304 stainless steel. The chamber interfaces seamlessly with a KF16 pumping port and a 1/4 inch ferrule connector for gas intake.
Power requirements are met with a single DC power supply, delivering a maximum output power of 150W, a sputtering power of 1200V, and support for a maximum sputtering current of 50mA. The vacuum system incorporates a dual-stage rotary vane vacuum pump, achieving a pumping rate of 1.1L/s (4m3/h) and maintaining an ultimate vacuum level of ≥0.1Pa, closely monitored through a resistance vacuum gauge. Operating on an AC 220V 50Hz power supply, the coater consumes a total power of 2kW. Its compact design, measuring 500mm x 320mm x 470mm and weighing 30kg, ensures suitability for various research and industrial thin-film deposition applications. These detailed technical specifications emphasize the coater's capabilities and design, ensuring precise and efficient coating processes.
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