DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering System with Thickness Monitor
VTC-600-2HD is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source for coating metallic film, and another RF source for coating non-metallic material. A film thickness tracker is included to enable the user to control processing easily.
Product Description
Introducing our VTC-600-2HD Dual-Head Magnetron Plasma Sputtering system, a compact and efficient solution designed for coating metallic and non-metallic materials with precision and ease. This desktop coater, certified with CE and TUV, embodies versatility and affordability for various applications, including alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, and PTFE coatings.
Operating on a 220VAC power supply with a frequency of 50/60Hz, this system draws a total power of 2000W, inclusive of the pump. The integrated sputtering power sources, housed within a single control box, include a 500W DC source for metallic coatings and a 600W RF source with automatching for non-metallic materials. Optionally, a Compact 300 RF source can be added for enhanced capabilities.
Equipped with two 2" Magnetron Sputtering Heads, each featuring water cooling jackets, this coater ensures efficient and precise coating. One head is dedicated to RF power for non-conductive materials, while the other connects to the DC power source for metallic coatings. The target size requirements are 2" in diameter, with a thickness range of 0.1 - 5 mm suitable for both metallic and non-conductive targets.
Customization options abound, allowing configurations with two DC heads without RF sputtering, RF heads without DC sputtering, or three RF heads, upon request. The stainless steel vacuum chamber, with a diameter and height of 300 mm, ensures durability and functionality. An observation window and a hinged top cover with air spring support facilitate easy target exchange.
The sample holder accommodates up to 4" wafers, offering adjustable rotation speeds and temperature control up to 500°C. Gas flow is managed by precision digital mass flow controllers, allowing two types of gases with a maximum flow rate of 200 ml/min. The vacuum pump station features a high-speed turbo vacuum pump from Germany, achieving a maximum vacuum level. Chamber baking enhances the maximum vacuum level to 10^-6 torr.
Integrated features include a precision quartz thickness sensor for monitoring coating thickness, and an LED display unit outside the chamber supports up to five quartz sensors, displaying total thickness coated and coating speed. Water cooling is required for this function.
The VTC-600-2HD's overall dimensions are L1300mm x W660mm x H1200mm, with a net weight of 160 kg. It comes with a one-year limited warranty and lifetime support, ensuring reliability. Recommended for optimal performance, use a 5% hydrogen + 95% nitrogen mixture to clean the chamber 2-3 times to remove oxygen, reducing it to below 10 ppm. Additionally, for plasma sputtering, it's advisable to use > 5N purity Argon gas due to the potential oxygen and H2O content in 5N purity Ar. Elevate your coating processes with the VTC-600-2HD.
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