DC/RF Dual-head high vacuum magnetron plasma sputtering coater
DC/RF dual-head high vacuum magnetron plasma sputtering coater is a compact magnetron sputtering system with dual 2 target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material.
Product Description
The DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater represents a cutting-edge solution for the precise coating of single or multiple film layers across a diverse range of materials, including alloys, ferroelectrics, semiconductors, ceramics, dielectrics, optics, and PTFE. Its compact design and user-friendly operation make it an ideal choice for laboratory applications, allowing researchers to efficiently prepare various material films.
Operating on a single-phase 220 VAC power supply at 50/60 Hz, this coater exhibits a total power consumption of 2000 W, inclusive of the vacuum pump and water chiller. Its innovative design incorporates two integrated sputtering power sources housed in a single control box. The 500 W DC source caters to metallic material coating, while the 300 W RF source, operating at 13.56 MHz, addresses the coating requirements of non-conductive materials. The coater is equipped with two 2" Magnetron Sputtering Heads, each featuring water cooling jackets and shutters. These heads enable the coating of 2" diameter targets with a thickness range of 0.1 - 5 mm, offering flexibility for both metallic and non-conductive materials.
The vacuum chamber, constructed from stainless steel, boasts a diameter and height of 300 mm, featuring two 100 mm diameter glass viewports—one fixed and one detachable for maintenance ease. A hinged lid, operated by a pneumatic power pole, streamlines target replacement. The sample stage, a rotatable and heatable ceramic heater with a copper cover, accommodates samples up to 140 mm in diameter or 4" wafers. Temperature control, adjustable from room temperature to 500°C, ensures precise conditions for up to 2 hours, facilitated by a digital temperature controller with an accuracy of +/- 1.0°C.
Gas flow control is achieved through two precision mass flow controllers (MFC), allowing the inlet of two gases with adjustable flow rates. An air inlet valve supports vacuum release. The mobile vacuum pump station, integral to the coater, combines a high-speed turbo pump (80 L/S) and a two-stage mechanical pump (220 L/min), ensuring rapid pumping speeds. The coater achieves a standard vacuum level of < 4.0E-5 Torr and can reach 1.0E-6 Torr with chamber baking. The system also includes a digital temperature-controlled recirculating water chiller, offering a refrigeration range of 5~35°C.
With overall dimensions of 48" × 28" × 32" (lid closed) and 48" × 28" × 37" (lid open), and a net weight of 160 kg, the coater comes with a one-year limited warranty and lifetime support, underscoring its commitment to reliability and performance in laboratory settings.
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