Compact dual-head plasma sputtering coating machine PSP180G-2TA

SKU: MND-134098
Model: PSP180G-2TA

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage.

 Product Description

This compact plasma sputtering coater, featuring a user-friendly PLC control system and touch screen operation, presents an accessible and efficient solution for laboratory coating experiments. Its aesthetically pleasing design and small size make it an optimal choice for various thin-film deposition processes. The dual-head plasma sputtering coating machine stands out for its technical specifications that enhance its versatility in thin-film applications.
 

The sample stage, measuring 100mm, provides ample space for accommodating diverse samples, with adjustable height within the range of 20 to 35mm. This adaptability ensures precise control over the distance between the sample stage and the target surface, optimizing coating conditions. Incorporating two 2-inch plasma sputtering sources with natural cooling methods, the machine ensures efficient operation. The vacuum chamber, constructed from high-purity quartz material and sized at φ180mm x 210mm, offers omnidirectional visibility through an observation window. Featuring a removable top cover and upper and lower covers made of durable 304 stainless steel, the chamber interfaces with a KF16 pumping port and a 1/4 inch ferrule connector for gas intake.
 

Power configurations include a single DC power supply delivering a maximum output power of 150W, supporting a sputtering power of 1200V and a maximum sputtering current of 50mA. The vacuum system comprises a dual-stage rotary vane vacuum pump with KF16 pumping ports and exhaust interfaces, achieving a pumping rate of 1.1L/s (4m3/h) and maintaining an ultimate vacuum level of ≥0.1Pa, monitored through a resistance vacuum gauge. Operating on an AC 220V 50Hz power supply, the machine consumes a total power of 1.5kW. Its compact design, measuring 500mm x 320mm x 470mm and weighing 30kg, ensures suitability for a wide range of research and industrial thin-film deposition applications. These comprehensive technical specifications delineate the machine's capabilities and design, ensuring precise and efficient coating processes.




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